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- the DC magnetron sputtering 直流反应磁控溅射
- High quality nickel films have been successfully plated on cenosphere particles by dc magnetron sputtering at mom temperature. 摘要本文论述了在空心微珠表面磁控溅射镀金属薄膜的方法。
- Nanocrystallized 309 stainless steel coating has been fabricated on glass substrate by DC magnetron sputtering. 用动电位极化、恒电位极化及交流阻抗技术研究了309不锈钢及其溅射纳米涂层在0。
- Abstract: The vanadium oxide thin films have been prepared by DC magnetron sputtering. 摘要：本文用直流磁控溅射法来制备氧化钒薄膜。
- Indium tin oxide(ITO) films were deposited by DC magnetron sputtering system in different deposition pressures and V(Ar):V(O2) gas mixtures. 用直流磁控溅射系统在不同气压和氩氧流量比(V(Ar):V(O2),体积比)下制备铟锡氧化物(ITO)薄膜。
- Binder is used to coat on the fabric that is prepared by DC magnetron sputtering to improve the combine fastness of aluminum layer. 摘要直流磁控溅射镀铝织物金属层牢度较差，文章采用在镀铝织物表面涂层粘合剂的方法来改善织物牢度。
- High quality nickel films have been successfully plated on cenosphere particles by dc magnetron sputtering at room temperature. 本文论述了在空心微珠表面磁控溅射镀金属薄膜的方法。
- Using Ternary alloy NiFeNb as a new seed layer, the (Ni_(82)Fe_(18))_(1-x)Nb_x(t nm)/Ni_(82)Fe_(18)(d nm)/Ta(3 nm) films are prepared with a DC magnetron sputtering system. 以三元合金NiFeNb作新种子层;采用直流磁控多靶设备制备了具有不同Nb含量(x)、NiFeNb厚度(t)和坡莫合金厚 度(d)的纳米级(Ni82Fe18)1-xNbx(tnm)/Ni82Fe18(dnm)/Ta(3nm)坡莫合金系列膜.
- IrMn top spin valves,with a structure of Ta/NiFe/CoFe/Cu/CoFe/IrMn/Ta,were deposited on glass and silicon substrate by high vacuum DC magnetron sputtering. 在玻璃和硅衬底上利用高真空直流磁控溅射的方法淀积了结构为Ta/NiFe/CoFe/Cu/CoFe/IrMn/Ta的IrMn顶钉扎自旋阀薄膜。 分别研究了增加磁电阻率,降低矫顽力和提高交换场的方法。
- The Nb/Al-AlOx/Nb all-niobium tunnel junctions were fabricated by dc magnetron sputtering, with selective niobium etching process and selective niobium anodiza-tion process. 用磁控溅射方法及选择铌阳极氧化和选择铌刻蚀工艺制备了Nb/Al-AlO_x/Nb全铌隧道结,给出了工艺要点。
- Stellite coatings were deposited on stainless steel 2Crl3 by DC magnetron sputtering and then were melted by electron beam. Corrosion resistances in 0.5M H2SQ4 and 0.1M NaCl solution were investigated by means of electrochemical technique. 在不锈钢2Cr13表面;用直流磁控溅射沉积;经电子束熔凝处理;获得司太立合金复层;利用电化学技术研究了在0.;5M硫酸和0
- Aluminum-doped zinc oxide (ZAO) ceramic targets for sputtering were fabricated by hot isostatic pressing (HIP) and ZAO transparent conducting thin films were prepared by dc magnetron sputtering. 用热等静压法烧结制备了高导电性ZAO(铝掺杂氧化锌)陶瓷靶材,并用直流磁控溅射法制备出ZAO透明导电薄膜。
- DC magnetron sputtering technology 直流磁控溅射
- A STUDY OF (Ti,Al)N HARD FILMS BY DC MAGNETRON SPUTTERING 直流磁控溅射(Ti、Al)N硬化膜的研制
- Application of DC Magnetron Sputtering Coating in the Glass Coating Technique 直流磁控溅射镀膜在玻璃涂层技术中的应用
- Kinetic Scaling of Iron Nitride Thin Films Deposited by DC Magnetron Sputtering 直流磁控溅射氮化铁薄膜生长的动力学标度
- Optimizing Gas Parameters of Low-resistance ITO Films Prepared by DC Magnetron Sputtering 磁控溅射低阻ITO薄膜的气体参数优化
- Effects of sputtering power on structure and properties of Ti films deposited by DC magnetron sputtering 溅射功率对直流磁控溅射Ti膜结构的影响
- Properties of ZAO Films Prepared by Non-reactive DC Magnetron Sputtering at Room Temperature 室温无反应磁控溅射法制备ZAO导电薄膜及其特性研究
- Preapration and Properties of Platinum Film Resistance by DC Magnetron Sputtering in Oxygen-containing Gas 含氧气氛直流磁控溅射薄膜铂电阻制备及性能研究
