Indium tin oxide(ITO) films were deposited by DC magnetron sputtering system in different deposition pressures and V(Ar):V(O2) gas mixtures.

• 用直流磁控溅射系统在不同气压和氩氧流量比(V(Ar):V(O2),体积比)下制备铟锡氧化物(ITO)薄膜。