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- The key to the technology is the gridless plasma source(GIS). 该技术核心是无栅等离子体源(GIS)。
- Combined with inductive coupled plasma source, MS can determine if water is polluted by elements like As or Pb. 结合电感等离子离子源，质谱是水中重金属等元素的检测的标准方法。
- This is accomplished by the use of an inductively coupled plasma source, usually argon. 这可通过电感藕合等离子体光源通常是氩气来实现。
- ZrN thin films were prepared on 45# steel by using ECR-microwave plasma source enhanced deposition. 利用ECR-微波等离子溅射沉积技术不同偏压下在45%23钢基体上制备了ZrN薄膜。
- The results show that the ECR plasma source may generate stable, high density plasma with low electron temperature. 实验证明，ECR等离子体源能够稳定地产生电子温度较低的高密度等离子体。
- In this paper, we fulfill this aim by using an ECR plasma source to create the plasma. 本研究利用ECR等离子体源在一个大型真空装置中来实现模拟低地球轨道空间等离子体环境。
- Chemical vapor deposition of hard diamond-like carbon (DLC) films was achieved using an inductively coupled plasma source (ICPS). 本文采用感应耦合等离子体源(ICPS)成功地实现化学气相沉积硬质类金刚石(DLC)膜,并考察了基片负偏压对类金刚石膜沉积过程和薄膜性质的影响。
- The silicon thin films on glass substrate were prepared using microwave ECR plasma source enhanced magnetron sputtering. 摘要利用微波ECR等离子体增强磁控溅射沉积技术在玻璃表面制备了矽膜。
- Diamond films had been deposited on quartz tube with the gas mixture of ethanol steam and hydrogen by the plasma source. 使用该等离子体源以乙醇蒸汽和氢气为气源在石英玻璃管外表面沉积金刚石膜。
- The plasma flow stream along the divergent magnetic field in an electron cyclotron resonance(ECR) plasma source has been simulated. 本文建立了一个物理模型，编写了数值程序，模拟了微波电子回旋共振（ECR）等离子体流的特性。
- Diagnostic test with Langmuir probe of the electron cyclotron resonance (ECR) plasma source was modified to evaluate our lab-built ECR plasma etching system. 摘要电子迴旋共振(ECR)等离子体以其密度高、工作气压低、均匀性好、参数易于控制等优点在超大规模集成电路工艺中获得了广泛的应用。
- Diagnostic test with Langmuir probe of the electron cyclotron resonance (ECR) plasma source was modified to evaluate our lab built ECR plasma etching system. 电子回旋共振(ECR)等离子体以其密度高、工作气压低、均匀性好、参数易于控制等优点在超大规模集成电路工艺中获得了广泛的应用。
- ECR plasma source consists of electrical soure,deflation system,air feed system,electron tube etc.For study purpose,It also includes a measurement &control system. ECR等离子源主要由电源系统、抽气系统、供气系统、真空室等设备组成,对于研究型设备,还包括测控部分。
- The auxiliary electrode radius in a vacant circular pipe is crucial to the ion dose in plasma source ion implantation(PSII),because it affects the resultant surface structure and properties. 在带有共轴零电位附加电极的空心圆管等离子体源离子注入过程中;附加电极半径的大小直接影响到空心圆管端点内表面、端点表面和外表面的离子注入剂量;进而影响空心圆管表面的结构和性质;对空心圆管的不同部位这种影响是不同的.
- Diamond-like carbon (DLC) film was fabricated on NiTi alloys surface adopting novel plasma immersion ion implantation and deposition (PIIID) at room temperature, using C2H2 as plasma source. 采用新型等离子浸没离子注入和沉积(PIIID)法以C2H2为等离子源对NiTi合金进行表面改性。
- The news comes from a reliable source. 这消息来自可靠的来源。
- With the rapid development of modern technology and MEMS technique, higher performance is required in the inductively-coupled plasma source (ICPS), so it becomes a focus and difficulty how to effectively design ICPS in ICP technology. 随着现代科技和MEMS工艺的发展，人们对电感耦合等离子体源的性能提出了更高的要求，所以如何有效地设计电感耦合等离子体源就成为电感耦合等离子体技术中的重点和难点。
- Micro-strip Spiral Resonator in Miniaturized Inductively Coupled Plasma Source‚ 2006 8th International Conference on Solid-State and Integrated Circuit Technology‚ 2006‚ Shanghai. “用于微波等离子体激励的微带环缝谐振器的设计”‚2005年全国微波毫米波会议‚2006‚深圳.
- It is shown that surface-wave plasma column discharge impedance plays an important part in analyzing the efficiency of plasma source and diagnosing plasma parameters such as densities, temperatures. 研究表明，表面波激发柱形等离子体的电离阻抗对等离子体源产生效率的分析及等离子体参数的诊断有着重要作用。
- A plasma globulin of high molecular weight. 大球蛋白细胞分子中较重的血球蛋白
