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- Indium tin oxide(ITO) films were deposited by DC magnetron sputtering system in different deposition pressures and V(Ar):V(O2) gas mixtures. 用直流磁控溅射系统在不同气压和氩氧流量比(V(Ar):V(O2),体积比)下制备铟锡氧化物(ITO)薄膜。
- Using Ternary alloy NiFeNb as a new seed layer, the (Ni_(82)Fe_(18))_(1-x)Nb_x(t nm)/Ni_(82)Fe_(18)(d nm)/Ta(3 nm) films are prepared with a DC magnetron sputtering system. 以三元合金NiFeNb作新种子层;采用直流磁控多靶设备制备了具有不同Nb含量(x)、NiFeNb厚度(t)和坡莫合金厚 度(d)的纳米级(Ni82Fe18)1-xNbx(tnm)/Ni82Fe18(dnm)/Ta(3nm)坡莫合金系列膜.
- This thesis is divided into two parts.In the first part, we deposite the flake-like graphite with the mixture of methane, hydrogen and argon in the R.F. magnetron sputtering system. 中文摘要本论文共分成两部份,在第一个部分是在射频溅镀系统中通入甲烷、氢气和氩气的混合气体,成长出片状结构的石墨。
- facing-target magnetron sputtering system 对靶磁控溅射
- Research of Unbalanced Magnetron Sputtering System 非平衡磁控溅射系统的研究
- The NiAl Nanometer Grain Coating by an Radio Frequency Magnetron Sputtering System 射频磁控溅射法制备NiAl纳米晶化合物涂层
- Investigation of the model of the discharge properties of the unbalanced magnetron sputtering system 非平衡磁控溅射沉积系统伏安特性模型研究
- Axial ion flux control in unbalanced magnetron sputtering system 非平衡磁控溅射系统的离子束流控制
- The ZrN films were deposited by RF magnetron reactive sputtering system. 使用反应性磁控溅镀系统成长氮化锆薄膜。
- DC magnetron sputtering system 直流磁控溅射
- Study of the discharge characteristic of an unbalanced magnetron sputtering system with an axial solenoid 同轴磁场对非平衡磁控溅射系统放电特性的影响
- This system can be used either as multi-arc or magnetron sputtering PVD individually. 也可以单独作为磁控溅射或多弧离子镀膜机使用。
- Si rich SiO2 films have been prepared by a rf magnetron sputter method. 用射频磁控溅射法制备了富硅二氧化硅薄膜。
- ABSTRACT: In this paper a reactive ion plating method and system configuration of Gas Ion source enhanced Magnetron Sputtering (GIMS) is presented in details. 摘要:本文详细介绍了气体离子源增强磁控溅射(气离溅射)反应离子镀膜技术和系统配置。
- However, it was equally significant of improving the modified electrode SERS active system with uniform and Pure Ag nanoparticle coatings based on magnetron sputtering. 尤其重要的是,论文中首次把磁控溅射应用于电极修饰,从而构筑了更高灵敏、高分辨的高效SERS活性体系。
- Study of Silicon Oxynitride Film Deposited by RF Magnetron Sputtering[J]. 引用该论文 朱勇;顾培夫;沈伟东;邹桐.
- In this study, the RF sputtering system has been investigated comprehensively. 中文摘要本篇论文主要是探讨RF溅镀系统之研究。
- magnetron sputtering system 磁控管溅射法
- Boron carbon nitride(BCN) thin films were deposited by radio frequency(RF) magnetron sputtering. 采用射频磁控溅射技术制备出硼碳氮(BCN)薄膜。
- Helium-charged Al films are prepared by direct current (DC) magnetron sputtering with a He/Ar mixture. 摘要采用氦氩混合气氛下直流磁控溅射沉积方法制备含有氦原子的金属铝膜。