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- selective dry etching 选择性干法刻蚀
- The principle and the main parameters of the dry etching for silicon dioxide are introduced. 摘要阐述了二氧化矽干法蚀刻的原理和主要的蚀刻参数。
- To approach as a resist in dry etching processing, etching properties of the films in oxygen plasma have been investigated. 为了探索该种薄膜在干刻蚀工艺过程中用作掩膜的可能性,还研究了它在氧离子体中的刻蚀性能。
- With the principles and processes of photolithography,dry etching and wet etching,the fabrication of the head slider were experimented. 然后利用光刻、湿法刻蚀和干法刻蚀的工艺及设备,分别进行了该磁头滑块结构的湿法和干法刻蚀试验,给出了刻蚀参数及所加工的磁头照片;
- PI (6FDA/BAPS) and PI (DSDA/HFBAPP) are verified including structure, viscosity, sensitivity, contrast, thermostabibity, dry etching resistance and other lithography parameters. 将合成之PI(6FDA/BAPS)与PI(DSDA/HFBAPP)做一连串基本性质鑑定与微影性质测试,结果证明此二种聚亚醯胺都具有优良电子束阻剂之特性。
- In addition, we reduced the air columns around the cavity and simulated the photonic bandgap and fabricated the devices by E-beam lithography and deep dry etching process. 未来将会对共振腔的几何形状做修正来符合光传播时的场型,并以此设计做出元件并加以量测。
- The first thing to do for this step is to select dry and pliable bamboos stalks. 在这个环节,首先要选材,要选取干燥、柔韧的竹子。
- After two layers of SiO2/ SiON with different refractive are finished, the designed mask pattern is printed on the film by photolithography, then through ICP for dry etching, the waveguide structures are obtained, for example AWG/EDG we obtained. 两层不同折射率的二氧化硅/氮氧化硅薄膜制备好后,再根据设计好的波导图形,经过光刻,感应耦合等离子体刻蚀(ICP)等工艺,制成所需要的光波导器件,如本研究中心制成的AWG、EDG等。
- A dry etch technology for poly-silicon using Cl2, SF6 and N2 mixed gas has been developed on Tegal 1512e. Different effects of positive resist mask for LDD and SiO2 mask for SST on the process are discussed. 在Tegal1512e设备上,采用Cl_2、SF_6、N_2混合气体,开发了多晶硅干法腐蚀工艺,讨论了LDD的正胶掩膜及SST的SiO_2掩膜对工艺的不同影响。
- Fabrication of Field Emitter Array with Dry Etching 干法刻蚀制作场发射阴极阵列
- Dry etching for high aspect ratio microstructures 深高宽比微结构的干法刻蚀
- Research of dry etching simulator in micromachining 微加工干法刻蚀工艺模拟工具的研究现状
- Study the effect reason of this method to provide data for mobile blood donation room in selecting dry chemical scrip reagent and reduce to waste blood. 探讨本法的影响因素 ,为流动采血点选用干化学试纸条试剂 ,减少血液浪费提供依据。
- New Development in Dry Etching of GaN 氮化镓干法刻蚀研究进展
- She helped to select a dress for Ruth. 她帮着给露丝选了一件衣裳。
- I dry my hands and face with the towel. 我用毛巾擦干了双手和面部。
- She is selective in the dresses she wears. 她对于自己穿的衣服精挑细选。
- Effects of Gas Carriers on Dry Etching of Silicon Dioxide 携带气体对二氧化硅干法刻蚀的影响
- The old well was bricked up when it ran dry. 旧井干枯以后被人用砖堵上了。
- The road is only negotiable in the dry season. 这条道只有在旱季才能通行。