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- A physical vapour deposition process applies the low friction, ceramic coating. 用物理蒸汽沉淀工艺施加低摩擦陶瓷涂层。
- vapour deposition process 气相沉积法
- Keywords EET;texture;vapours deposition process;film; 织构;气相沉积;薄膜;
- The continuous SiC fibers coated with B 4C using chemical vapour deposition(CVD) were made. 采用化学气相沉积 (CVD)方法 ,在连续SiC纤维表面沉积一层B4C涂层。
- Developments of diamond films by plasma chemical vapour deposition are reviewed in the paper. 本文评述了化学气相沉积法制备人造金刚石薄膜的进展情况。
- A chemical vapor deposition process that takes place at moderate temperatures. 一种化学汽相淀积过程,发生在适度的温度下。
- The desensitized explosive PETN film was prepared by physical vapour deposition (PVD) technology, and SEM was used to analyze the microstructure and grain size of PETN film. 摘要采用物理气相沉积(PVD)技术研制了钝化太安炸药薄膜，对薄膜的微观结构和颗粒粒度进行了分析，对颗粒粒度与薄膜爆轰波稳定传播临界尺寸的关系进行了探索。
- Spent oil deposition processing and marketing. 废机油沉淀加工、销售。
- This paper reviews comprehensively the recent development of amor- phous silicon films fabricated by light induced chemical vapour deposition(LCVD). 本文较系统地评述了光诱导化学汽相淀积(LCVD)技术淀积非晶硅薄膜的开发现;
- Thin film of tellurium was prepared by chemical vapour deposition on the polyethylene foils using room-temperature decomposition of electrochemically generated hydrogen telluride. 用化学气相沉积法制备碲薄膜,其步骤为:通过电化学方法制得碲化氢,碲化氢在室温下分解后在聚乙烯塑料箔上沉积得到碲薄膜。
- TiO 2 thin films were prepared by chemical vapour deposition(CVD) with the source of tetra iso propyl titanate (Tiliso OC 3H 7) 4,TPT) and its optical properties are studied. 以四异丙醇钛（简称TPT）为钛源物质，采用常压化学气相沉积（CVD）法制备了TiO2膜，并对其光学性质进行了研究。
- The desensitized explosive PETN film was prepared by physical vapour deposition(PVD) technology,and SEM was used to analyze the microstructure and grain size of PETN film. 采用物理气相沉积(PVD)技术研制了钝化太安炸药薄膜,对薄膜的微观结构和颗粒粒度进行了分析,对颗粒粒度与薄膜爆轰波稳定传播临界尺寸的关系进行了探索。
- Typical of the dopant chemistry is the reaction for arsine, which is depicted with the deposition process in Fig. 9. 砷化三氢的反应是典型的掺杂化学反应，图9显示了该反应的淀积过程。
- New advance in chemical vapour deposition(CVD) , physical vapour deposition(PVD) .surfacemodification technology and other new technology in surface treatment were reviewed. 简要地评述了化学气相沉积(CVD)、物理气相沉积(PVD)、表面改性技术和其它表面处理技术的新进展。
- Spray deposition process can be optimized by studying the scanning regularity of atomizer and other process parameters. 通过对雾化器往复扫描规律以及其它工艺参数的研究,可以对喷射沉积过程进行工艺优化。
- By chemical deposition process,nickel electrode on PTCR ceramics of ohmic contact can be acquired at low cost. 用化学沉积法在PTCR陶瓷上制作镍电极可形成良好的欧姆接触，且成本较低。
- The principle of ion assisted deposition technology in the vacuum deposition process is discussed. 讨论了离子束辅助沉积技术在真空沉积过程中的应用原理。
- Plate blanks of Al8Pb4Si1.5Sn1Cu alloy were made by spray deposition process, and cladding rolling of this kind of plate with Al foil was experimented. 用雾化沉积工艺方法制备了Al?8Pb?4Si?1.;5Sn?1Cu合金板坯，并与铝箔一起进行轧制复合试验。
- The two major techniques used are Chemical Vapour Deposition (CVD) and Physical Vapour Deposition (PVD).These can result in the deposition of two-dimensional blanket or patterned thin films. 因此本实验中将凹形及矩形之铜箔以叠加方式组合成一电极群，并藉由微细放电加工方法加工出具有数十道槽状的微细散热片。
- The commercial computational fluid dynamics (CFD) code FLUENT was extended to simulate the aerosol deposition process in an electrospraying system. 摘要通过对商用计算流体力学软件FLUENT进行功能扩展，实现了空气流场、空间电场和离散雾场多场耦合过程的数值模拟。
