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- Synthesis of aligned carbon nanotube and their growth mechanism by chemical vapour deposition method 化学气相沉积法制备定向碳纳米管及其生长机理的研究
- vapour deposition method 蒸汽淀积法
- A physical vapour deposition process applies the low friction, ceramic coating. 用物理蒸汽沉淀工艺施加低摩擦陶瓷涂层。
- The continuous SiC fibers coated with B 4C using chemical vapour deposition(CVD) were made. 采用化学气相沉积 (CVD)方法 ,在连续SiC纤维表面沉积一层B4C涂层。
- Developments of diamond films by plasma chemical vapour deposition are reviewed in the paper. 本文评述了化学气相沉积法制备人造金刚石薄膜的进展情况。
- The desensitized explosive PETN film was prepared by physical vapour deposition (PVD) technology, and SEM was used to analyze the microstructure and grain size of PETN film. 摘要采用物理气相沉积(PVD)技术研制了钝化太安炸药薄膜，对薄膜的微观结构和颗粒粒度进行了分析，对颗粒粒度与薄膜爆轰波稳定传播临界尺寸的关系进行了探索。
- This paper reviews comprehensively the recent development of amor- phous silicon films fabricated by light induced chemical vapour deposition(LCVD). 本文较系统地评述了光诱导化学汽相淀积(LCVD)技术淀积非晶硅薄膜的开发现;
- Thin film of tellurium was prepared by chemical vapour deposition on the polyethylene foils using room-temperature decomposition of electrochemically generated hydrogen telluride. 用化学气相沉积法制备碲薄膜,其步骤为:通过电化学方法制得碲化氢,碲化氢在室温下分解后在聚乙烯塑料箔上沉积得到碲薄膜。
- The diffusion coefficient of RaA atoms,being 0.071cm~2/s,was determinedusing two-filter wall deposition method. 采用壁沉积方法;测得 RaA 的扩散系数 D=0.;071cm~2/s。
- TiO2 films were prepared by sol-gel and print screen method, MgO/TiO2 films were prepared by liquid deposition method. 用sol-gel法和丝网印刷法制备多孔TiO2薄膜,溶液沉积法制备MgO/TiO2复合薄膜。
- TiO 2 thin films were prepared by chemical vapour deposition(CVD) with the source of tetra iso propyl titanate (Tiliso OC 3H 7) 4,TPT) and its optical properties are studied. 以四异丙醇钛（简称TPT）为钛源物质，采用常压化学气相沉积（CVD）法制备了TiO2膜，并对其光学性质进行了研究。
- The desensitized explosive PETN film was prepared by physical vapour deposition(PVD) technology,and SEM was used to analyze the microstructure and grain size of PETN film. 采用物理气相沉积(PVD)技术研制了钝化太安炸药薄膜,对薄膜的微观结构和颗粒粒度进行了分析,对颗粒粒度与薄膜爆轰波稳定传播临界尺寸的关系进行了探索。
- The pearly pigment of mica titanium was prepared by using the liquid deposition method with the urea as precipitant. 采用尿素作为中和剂,用液相沉积法制备了云母钛珠光颜料。
- A template-free electrochemical deposition method for preparations of ZnO nanorod array is reported. 摘要报道了一种氧化锌纳米线阵列的无模板电沉积制备方法。
- New advance in chemical vapour deposition(CVD) , physical vapour deposition(PVD) .surfacemodification technology and other new technology in surface treatment were reviewed. 简要地评述了化学气相沉积(CVD)、物理气相沉积(PVD)、表面改性技术和其它表面处理技术的新进展。
- Abstract： C-N films were synthesized on high-resistance Si(111) substrates by cluster beam deposition method. 利用荷能团簇沉积装置在高阻硅(111)衬底上沉积了碳氮薄膜。
- BaTiO_3/SrTiO_3 (BTO/STO) multilayer films have been fabricated on Pt/Ti/SiO_2/Si substrates by a pulsed laser deposition method. 采用脉冲激光沉积法在Pt/Ti/SiO2/Si衬底上制备了BaTiO3/SrTiO3(BTO/STO)多层膜。
- The plating used an economical copper replacement deposition method that differs from general electrodeless-plating pretreatment. 利用简单、低成本的置换沉积铜法新工艺，进行表面金属化处理。
- Ionized cluster beams(ICB) is a deposition method which can form high quality film even single crystal in room temperature. 离化团束沉积是一种可在室温条件下获得高质量薄膜甚至单晶膜的沉积方法。
- The two major techniques used are Chemical Vapour Deposition (CVD) and Physical Vapour Deposition (PVD).These can result in the deposition of two-dimensional blanket or patterned thin films. 因此本实验中将凹形及矩形之铜箔以叠加方式组合成一电极群，并藉由微细放电加工方法加工出具有数十道槽状的微细散热片。
