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- vapor deposited screen 蒸发荧光屏
- The bonding strength of vapor deposited hard films are measured by this meth... 但人们在膜基结合的测试技术上仍有困难。
- Erosive wear behavior of chemical vapor deposited multilayer tungsten carbide coating. 化学气体的侵蚀损耗作用形成多层碳化钨外壳。
- Ultra-High Vacuum Physical Vapor Deposition. 超高真空物理汽相沉积。
- At last, the study of using Monte-Carlo method to simulate the growth of thin films by physical vapor deposited is also predicted. 最后对蒙特卡罗方法模拟薄膜生长的研究进行了展望。
- In vapor deposition,RE elements can increase the bo... 结果表明,稀土元素的加入均能显著提高模具的使用寿命。
- InGaN Films Grown by Metalorganic Chemical Vapor Deposition[J]. 引用该论文 江风益;李述体;王立;彭学新;熊传兵.
- The integration of chemical vapor deposited organo-silicate glass (OSG) interlayer dielectrics (ILD) has challenged the IC industry to formulate new methods of metrology and characterization. 在化学气相沉积有机矽酸盐玻璃交界层介电质对积体电路工业而言形成度量和特性的新方法是具有挑战性。
- The refractory metals and refractory metal silicides that are used to augment or replace the polysilicon are generally deposited by physical vapor deposition processes. 用于增强和取代多晶硅的难熔金属和难熔金属硅化物通常是用物理蒸发沉积工艺沉积的。
- BC 2N thin films were deposited by hot filament assisted chemical vapor deposition (CVD) on Si and diamond substrates. 应用热丝辅助射频等离子体化学气相沉积法在硅、金刚石衬底上合成了 BC2 N薄膜 .
- A chemical vapor deposition process that takes place at moderate temperatures. 一种化学汽相淀积过程,发生在适度的温度下。
- Ultrathin organosilicon films were synthesized by chemical vapor deposition. 用化学气相沉积方法制备了超薄有机硅膜。
- Heavy Carbon Doping of GaAs by Metalorganic Chemical Vapor Deposition[J]. 引用该论文 李宝霞;汪韬;李晓婷;赛小锋;高鸿楷.
- DLC films were deposited by capacitively coupled radio frequency plasma enhanced chemical vapor deposition. 顶层DLC膜用容式耦合射频等离子体增强化学气相沉积方法制备。
- A cloud is a mass of vapor in the sky. 云是天空中的水汽团。
- Diamond,diamond/TiC composite and boron doped diamond films were deposited by plasma assistant hot-filament chemical vapor deposition(PAHFCVD). 采用等离子辅助热丝化学气相沉积(PAHFCVD)装置进行了金刚石薄膜、碳化钛/金刚石复合膜、掺硼金刚石薄膜的制备。
- They picked up the yacht on their radar screen. 他们在雷达屏上看到了那艘游艇。
- Fluorinated amorphous carbon(a-C:F) films were deposited using C_4F_8 and CH_4 as precursor gases by electron cyclotron resonance chemical vapor deposition (ECR_CVD). 采用电子回旋共振等离子体化学气相淀积(ECR-CVD)法;以C4F8和CH4为源气体制备了非晶氟化碳(a-C:F)薄膜.
- He adores this screen goddess with godliness. 他十分虔诚地崇拜女明星。
- The wearresistance of TA1 was improved by chemical vapor deposition(CVD) to enhance the TA1 properties. 为提高TA1表面的耐磨性能,在TA1表面采用化学气相沉积(CVD)表面处理。