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- The SnO2/CeO2 thin film was prepared by powder sputter method. 利用粉末溅射,研究了 SnO2/CeO2微型平面薄膜。
- thin film sputtering 薄膜溅射
- Thin film manganin gages and ytterbium gages were fabricated by magnetron sputtering. 采用磁控溅射法制备锰铜薄膜,溅射和真空蒸发法制备镱薄膜。
- Recently, various magnetron sputtering lines for thin film deposition on large-size glass substrate grow rapidly and attract significant attention. 摘要近年来，各种工业生产规模的玻璃基片大平面磁控溅射生产线发展迅速，令人关注。
- BCN thin films were grown by RF reactive sputtering. 用射频反应溅射法制备出 BCN薄膜 .
- A redox polymer is dip-coated on the surface of the sputter thin film gold working electrode on the plastic substrate. 将氧化还原聚合物滴在塑料基片上溅射的金薄膜工作电极上形成一层对过氧化氢的敏感膜。
- K. Wasa, M. Kitabatake, H. Adachi and Makoto, Thin film materials technology: Sputtering of compound materials, William Andrew, 2004. 国家实验研究院，真空技术与应用，仪器科技研究中心出版，2004年。
- Abbreviation of Thin Film Transistor. 薄膜晶体三极管的缩写。
- A thin film formed on the surface of the pulp. 纸浆表面结了一层膜。
- AAM also offers 99.95 pure Nb sputtering Target for thin film applications.We supply ingot,plate and final target depending on customer needs. 中精伦也为高科技行业提供高纯铌靶，我们根据客户的具体需要提供铸锭、板材和最终靶材。
- The techniques of depositing zinc thin film on grass substrate by vacuum evaporation and direct-current sputtering were investigated with XRD, SEM and AFM in this paper. 本论文对真空蒸发法和直流溅射法沉积锌膜的工艺进行了研究,结合XRD、SEM、AFM等分析手段,以探索这两种方法在制备锌膜方面的一般规律。
- The basic principle of sputtering was presented, and the targets and techniques used in the preparation of titania thin film from sputtering were reviewed and discussed. 介绍了溅射法镀膜的基本原理,阐述了溅射法镀二氧化钛薄膜用靶材及相应溅射镀膜工艺的研究现状。
- The work contains the following aspects: 1.Describe the process of the fabrication of titanium dioxide thin film using a magnetron sputtering and pulsed laser deposition. 内容和结论主要包括:1.;采用磁控溅射和脉冲激光沉积方法制备二氧化钛薄膜的过程。
- First, we used DC sputter system to deposit hafnium metal and then proceeded with furnace under oxidation at low temperature to prepare HfO2 thin film. 首先利用直流溅镀法沉积铪金属，接著以低温通氧气的炉管氧化金属铪，而得到氧化铪薄膜。
- Magnetron sputtering is a widely used method for thin film deposition in recent years,which makes a great impact on the industrial production and scientific research. 近年来磁控溅射技术的应用日趋广泛,在工业生产和科学研究领域发挥巨大作用。
- MoSi2 thin film with single tetragonal phase and low resistivity is successfully prepared on (001) Si substrate at normal temperature and 0.3Pa sputtering pressure. 在基体温度为常温、溅射气压为0.;3Pa下，在硅基体上成功制备了单相低电阻率的MoSi2薄膜。
- Yang interference of double slits, thin film interference. 杨氏双缝干涉。薄膜干涉。
- Suzhou NSG AFC THIN FILMS ELECTRONICS CO., LTD. 苏州美日薄膜电子有限公司。
- This is the output terminal of a thin film transistor (TFT). 这是末端一只薄膜晶体三极管的生产(TFT).
- The CMR effect of the thin films was investigated . 研究了La_(1-x)Te_xMnO_3薄膜的CMR效应。
