The basic principle of sputtering was presented, and the targets and techniques used in the preparation of titania thin film from sputtering were reviewed and discussed.

 
  • 介绍了溅射法镀膜的基本原理,阐述了溅射法镀二氧化钛薄膜用靶材及相应溅射镀膜工艺的研究现状。
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