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- scanning ion beam etch 扫描离子束刻蚀
- We used Ebeam lithography to define the photonic crystal patterns and ion beam etcher for the etching process. 元件制作方面，我们使用电子束微影系统来定义光子晶体的图形，并用离子束蚀刻机进行蚀刻制程。
- Ion Beam Etching of Binary Optics Microlens Arrays and the Test of Diffraction Efficiency[J]. 引用该论文 赵光兴;杨国光;陈洪璆;侯西云.
- The ion beam etching process in fabricating refractiue microlens is simulated by setting up the etching model of Argonion beam to resist microlens. 建立氩离子束对光刻胶微透镜的刻蚀模型,模拟折射微透镜制备中的离子束刻蚀工艺过程。
- According to the technical process of ion beam etching on Diffractive Optical Element (DOE), a distribution of surface error in ion beam etching was presented. 摘要针对衍射光学元件(DOE)的离子束刻蚀工艺，结合掩模套刻过程实例，本文提出了刻蚀误差面形分布的概念。
- Introduces the production of the high frequency fundamental-mode inverted mesa crystal resonators with ion beam etching and the application of inverted mesa crystal resonators. 介绍了应用离子束刻蚀技术制作高基频反台晶体谐振器及反台晶体谐振器的应用。
- Through simulation the profiles of refractiue microlens obtained in the different ion beam incident angles can be predicted, which is the basis for optimizing the ion beam etching process and determine the end time of etching process. 通过模拟可以预先获得离子束在不同倾斜入射状态下所得到的折射微透镜的截面轮廓 ,为优化离子束的刻蚀工艺奠定基础 ,同时也可以确定刻蚀过程的终点时刻。
- Fresnel lens fabricated by ion beam etching 离子束刻蚀法制作菲涅耳透镜
- Reactive Ion Beam Etching and Its Application 反应离子束刻蚀及其应用
- Generic specification of ion beam etching system 离子束蚀刻机通用技术条件
- reactive ion beam etching (RIBE) 反应离子束刻蚀
- reactive ion beam etch 活性离子束腐蚀
- TECHNOLOGY OF REACTIVE ION BEAM ETCHING OF BLAZED GRATINGS 反应离子束刻蚀闪耀光栅技术
- Novel Fabrication Technique for Nanogroove Using Ion Beam Etching 一种新颖的基于离子束刻蚀的纳米沟道制备技术
- The method of electrochemical micro process based on scanning ion conductance microscopy (SICM) is developed. 提出了基于扫描离子电导显微术（SICM）的电化学微细加工方法。
- It is a technique called ion beam writing. 这一技术被称为离子束刻写。
- Ion beam mutation has significant bio-effect. 摘要离子诱变具有显著的生物学效应。
- Acceptable Error of Etching Depth in Ion Beam Etching Microlens 离子束蚀刻微透镜中蚀刻深度允许误差的研究
- Study on step sidewall tilt in ion beam etching of Fresnel lens 离子束刻蚀过程中台阶侧壁倾斜现象研究
- DNA microarray plate in quartz glass substrate fabricated by ion beam etching 用光刻及离子束蚀刻技术制作DNA芯片模版
