Through simulation the profiles of refractiue microlens obtained in the different ion beam incident angles can be predicted, which is the basis for optimizing the ion beam etching process and determine the end time of etching process.

• 通过模拟可以预先获得离子束在不同倾斜入射状态下所得到的折射微透镜的截面轮廓 ,为优化离子束的刻蚀工艺奠定基础 ,同时也可以确定刻蚀过程的终点时刻。