您要查找的是不是:
- plasma etching method 等离子蚀刻法
- The reactor is capable of working in the RIE (reactive ion etching) mode and also in the plasma etching mode. 反应腔拥有在RIE(反应离子刻蚀)模式和等离子刻蚀模式下工作的能力。
- A patterned DLC thin film cath ode was fabricated by reactive -ion etching method and mic ro -fabrication technology. 通过离子束技术和微细加工技术可以实现DLC薄膜的图形化并能大大提高薄膜的场发射性能。
- Diagnostic test with Langmuir probe of the electron cyclotron resonance (ECR) plasma source was modified to evaluate our lab-built ECR plasma etching system. 摘要电子迴旋共振(ECR)等离子体以其密度高、工作气压低、均匀性好、参数易于控制等优点在超大规模集成电路工艺中获得了广泛的应用。
- It indicates that the plasma-assisted etching method is very valid to fabricate deep grating. 通过等离子体辅助刻蚀技术制作出了立方状亚波长抗反射光栅。
- This thesis considers the delamination behaviors between substrate and molding compound for Ball Grid Array (BGA) products caused by the plasma etching process. 中文摘要本文针对阵列锡球封装产品基板和胶饼间所产生的分层作研究。
- The ice etching method was adapted to duplicate the form of grains in microvilli membrane. 采用冰冻蚀刻法复制微绒毛膜膜内粒子形态。
- This paper describes a new crosshatching technology on PI flexible substrate, using chemically etching method. 本文介绍一种在挠性聚酰亚胺基材上开窗口的新工艺。
- Diagnostic test with Langmuir probe of the electron cyclotron resonance (ECR) plasma source was modified to evaluate our lab built ECR plasma etching system. 电子回旋共振(ECR)等离子体以其密度高、工作气压低、均匀性好、参数易于控制等优点在超大规模集成电路工艺中获得了广泛的应用。
- Austenite grain size of plain carbon steel and alloy steel were examined by oxidization and grain boundary etching method. 采用氧化法和晶粒边界腐蚀法对几种不同的碳钢和合金钢的奥氏体晶粒的显示进行了对比试验。
- This research is base on the recent technology of grinding process, and then apply the batch etching method to improve the wafer thining. 本研究建立在现行轮磨可达到的薄化基础上,以批次式蚀刻方式将矽晶圆做更进一步的薄化。
- The chemical etching method wa applied to form surface texture of multicrystalline silicon in order to reduce the reflectance of the surface. 为了降低光在多晶硅表面的反射,采用化学腐蚀法在其表面制备了绒面。
- We fabricate desired structured surfaces by holographic lithography, plasma etching and Teflon coating.The performance is evaluated by measuring the reflectance spectrum and contact angle. 实验上,我们采用全像微影术、电浆蚀刻以及旋镀铁氟龙的方式来制作试片,并量测该试片的反射频谱和接触角。
- Abstract: The characteristics and progress of lithography technique and plasma etching technology are summarized.Their physical mechanisms and current research problems are also explained. 文摘:介绍了光刻与等离子体刻蚀技术的特点与进展,阐述了等离子体刻蚀的物理机制与前沿问题.
- We found that the mole ratio of the raw materials, gelling temperature, carbonization temperature and etching method could effect the pore structures of the porous carbons. 研究发现,影响多孔炭孔结构的主要因素是原料的摩尔比,另外还与胶凝温度、炭化温度、刻蚀方式有关。
- We found that the mole ratio of the raw materials,gelling temperature,carbonization temperature and etching method could effect the pore structure of the porous carbons. 研究发现,影响多孔炭孔结构的主要因素是原料的摩尔比,另外还与胶凝温度、炭化温度、刻蚀方式有关。
- An in-situ particle monitor was installed on a plasma etch tool chamber.This article includes a discussion of two major problems detected on the plasma etch tool within a three-week period. 在等离子体蚀刻工具主舱内安装一个现场粒子监测器,对两个主要问题进行了三周的测试并展开了讨论。
- With the aid of a water-heater controllable in both temperature and time, the chemical etching method adding a bit hydrofluoric acid and xylene in traditional picric acid sa... 结果表明:利用控温控时水浴锅采用传统饱和苦味酸滴加微量氢氟酸和二甲苯的试剂可清晰显示不同状态下的奥氏体晶界。
- The Research on Plasma Etching Photoresists 等离子体腐蚀去胶的探讨
- For example, etching methods can easily repair non-even sand plane produced by sand blasting. 如果喷沙的沙面不均匀,可以用蚀刻方法轻易再返工修正,减少废品。