您要查找的是不是:
- parallel plate plasma etcher 平行板等离子体腐蚀装置
- And then the equivalent circuit of sheath and plasma in parallel plate RF discharge is analyzed. 再分析平行电极RF放电当中的鞘层及电浆的等效电路。
- The proposed methodologies are applied to detection and classification faults for a particular tool function of a plasma etcher in semiconductor fabrication. 针对所提出的方法,实际应用于半导体制造之电浆蚀刻的机台参数的错误侦测及鑑别,并得之验证。
- Using the coordinate transform and conformal mapping technique, the ellipilic cone stripline is transformed to a parallel plate stripline. 假设中心导体带是无限薄理想导体,传输的是TEM模,通过坐标变换和共形映射,把椭圆锥带线变为有限宽平行板带线。
- An in-situ particle monitor was installed on a plasma etch tool chamber.This article includes a discussion of two major problems detected on the plasma etch tool within a three-week period. 在等离子体蚀刻工具主舱内安装一个现场粒子监测器,对两个主要问题进行了三周的测试并展开了讨论。
- Multiple parallel plate electrode plasma enhanced CVD system 多平行电极等离子体增强型
- Vincent Lin and Sih-Li Chen*, 2003, "Performance Analysis, Optimum and Experimental Verification for Parallel Plate Heat Sink Associated with Single Non-Uniform Heat Source", ASME, InterPack. 陈柏任;林茂青;陈希立*;2003;"两相密闭热虹吸式热管储能系统之性能研究";中国机械工程学会第二十届全国学术研讨会;台湾;台北.
- The abstraction of energy and momentum in electromagnetic fields is concretized through analyzing the movement of conducting rod in parallel plate capacitor in a uniform magnetic field. 由于空间站是一个本质非线性系统,一般的线性控制策略很难使其姿态控制和动量管理获得比较满意的性能。
- According to the form of sealed components, often divided into several different valve types, such as: Wedge Gate Valve, parallel valve, parallel plate双闸valve, wedge gate, such as双闸board. 根据密封元件的形式,常常把闸阀分成几种不同的类型,如:楔式闸阀、平行式闸阀、平行双闸板闸阀、楔式双闸板闸等。
- The reactor is capable of working in the RIE (reactive ion etching) mode and also in the plasma etching mode. 反应腔拥有在RIE(反应离子刻蚀)模式和等离子刻蚀模式下工作的能力。
- A sufficiently energetic particle can penetrate the entire stack of parallel plates. 能量充足的粒子能够穿透全部平行板。
- Study on Characteristics of RF Resonance of Plasma in Parallel Plate Electrode 平行极板间等离子体RF共振特性研究
- Plasma Etch Advanced Process Control ( In-situ Endpoint Detectors ) 等离子刻蚀过程控制(在线终点探测器)
- A cell with transparent walls contains the liquid between a pair of parallel plates. 四壁透明的容器中,放一对平行板,板间盛有液体。
- In this paper, pressure distribution of gaseous slip flow in parallel plates microchannel was studied. 对平行平板微型槽中气体滑移流动的压强分布特性进行了研究。
- The solutions for Newtonian fluid between two infinite parallel plates appear as limiting cases of our solutions. 两无穷长平板之间的牛顿流的解可以作为该文所研究问题解的极限情况而得到。
- Diagnostic test with Langmuir probe of the electron cyclotron resonance (ECR) plasma source was modified to evaluate our lab-built ECR plasma etching system. 摘要电子迴旋共振(ECR)等离子体以其密度高、工作气压低、均匀性好、参数易于控制等优点在超大规模集成电路工艺中获得了广泛的应用。
- This thesis considers the delamination behaviors between substrate and molding compound for Ball Grid Array (BGA) products caused by the plasma etching process. 中文摘要本文针对阵列锡球封装产品基板和胶饼间所产生的分层作研究。
- Computational results showed that pressure distribution curve in parallel plates microchannel was convex decreasing parabolic curve. 模拟计算结果表明,平行平板间滑移流动的气体压强分布曲线是上凸的下降抛物曲线。
- Diagnostic test with Langmuir probe of the electron cyclotron resonance (ECR) plasma source was modified to evaluate our lab built ECR plasma etching system. 电子回旋共振(ECR)等离子体以其密度高、工作气压低、均匀性好、参数易于控制等优点在超大规模集成电路工艺中获得了广泛的应用。