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- Microwave plasma etching CVD diamond films as a means enhancing mechanical lapping efficiency 微波等离子刻蚀CVD金刚石膜提高机械研磨效率
- microwave plasma etching 微波等离子体腐蚀
- The reactor is capable of working in the RIE (reactive ion etching) mode and also in the plasma etching mode. 反应腔拥有在RIE(反应离子刻蚀)模式和等离子刻蚀模式下工作的能力。
- The Plasma Batch System 300 is a compact Microwave Plasma Batch System for resist ashing and wafer cleaning in semiconductor applications. 微波等离子体300是一个简洁的微波等离子，主要应用于半导体方面的灰烬消除和晶片清洁。
- CN x films were deposited on the Si(100) substrates with microwave plasma CVD method. 沉积在Si（100）基片上的CNx膜是用微波等离子体化学气相沉积法（MWPCVD）制备的。
- Diagnostic test with Langmuir probe of the electron cyclotron resonance (ECR) plasma source was modified to evaluate our lab-built ECR plasma etching system. 摘要电子迴旋共振(ECR)等离子体以其密度高、工作气压低、均匀性好、参数易于控制等优点在超大规模集成电路工艺中获得了广泛的应用。
- The diamond films doped with boron were synthesized on the Si 3N 4 substrate by microwave plasma CVD method (MPCVD). 采用微波等离子体化学气相沉积 ( MPCVD)的方法在 Si3N4 基片上制作了掺硼金刚石薄膜。
- This thesis considers the delamination behaviors between substrate and molding compound for Ball Grid Array (BGA) products caused by the plasma etching process. 中文摘要本文针对阵列锡球封装产品基板和胶饼间所产生的分层作研究。
- Determination of alkali earth metal by microwave plasma torch atomic emission spectrometry (MPT AES) was investigated. 用微波等离子体炬原子发射光谱法（MPT－AES）测定了一些碱土金属元素。
- Diagnostic test with Langmuir probe of the electron cyclotron resonance (ECR) plasma source was modified to evaluate our lab built ECR plasma etching system. 电子回旋共振(ECR)等离子体以其密度高、工作气压低、均匀性好、参数易于控制等优点在超大规模集成电路工艺中获得了广泛的应用。
- Formation of polymeric deposit was investigated in methane conversion by microwave plasma. 摘要考察了微波等离子体甲烷转化反应中积炭的形成条件。
- Plasma systems 400 and 660 are low-pressure microwave plasma systems for cleaning advanced chip packages prior to die attach, wire bond and encapsulation. 等离子体400和660系列是低压微波等离子体应用于提高模具粘合，引线的焊接，特别是清洗高级的芯片封装。
- This paper presents a new method of reduction of sintering low concentration fume absorbed with solid waste by microwave plasma. 提出了一种微波-固体废弃物吸附法降低烧结低浓度有害废气的新方法。
- Watanabe I,Sugata K.Diamond films synthesized by microwave plasma CVD of ethylalcohol[J].Jpn J Appl Phys,1988,27(8):1397. 丁发柱;石玉龙.;直流等离子体-热丝化学气相沉积金刚石薄膜的研究[J]
- We fabricate desired structured surfaces by holographic lithography, plasma etching and Teflon coating.The performance is evaluated by measuring the reflectance spectrum and contact angle. 实验上，我们采用全像微影术、电浆蚀刻以及旋镀铁氟龙的方式来制作试片，并量测该试片的反射频谱和接触角。
- Microwave plasma torch atomic emission spectrometry(MPT-AES) was used to determine the content of calcium and zinc in kelp after being digested. 分别使用常规消解方法与微波消解方法处理海带样品,采用微波等离子体炬原子发射光谱法(MPT-AES)测定海带中钙和锌的含量。
- Abstract: The characteristics and progress of lithography technique and plasma etching technology are summarized.Their physical mechanisms and current research problems are also explained. 文摘:介绍了光刻与等离子体刻蚀技术的特点与进展，阐述了等离子体刻蚀的物理机制与前沿问题.
- The method for improving surface wettability of styrene butadiene rubber using microwave plasma is provided in this paper. 介绍了一种用微波等离子体处理消声瓦橡胶以提高表面湿润性的方法,并用蒸馏水和醇对接触角进行测定。
- Under the catalytic effect of nickel particles, spring-like carbon filaments were synthesized through microwave plasma chemical vapor deposition. 以镍为催化剂,利用微波等离子体化学气相沉积法制备了弹簧状碳纤维。
- An in-situ particle monitor was installed on a plasma etch tool chamber.This article includes a discussion of two major problems detected on the plasma etch tool within a three-week period. 在等离子体蚀刻工具主舱内安装一个现场粒子监测器,对两个主要问题进行了三周的测试并展开了讨论。
