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- TITAN ion source is a new ion source which can produce strong metal and gas ion beam. Use . TITAN离子源是一种新的能够同时产生强金属和气体离子束流的离子源。
- ABSTRACT: In this paper a reactive ion plating method and system configuration of Gas Ion source enhanced Magnetron Sputtering (GIMS) is presented in details. 摘要：本文详细介绍了气体离子源增强磁控溅射（气离溅射）反应离子镀膜技术和系统配置。
- Internal gas ion source flange on bottom 底板上气体离子源法兰
- The demands on the broad ion sources for material modification are described. The kaufman gas ion sources and the Electron beam evaporation metal ion source (EBE) of high current are emphasised. The RF, ECR, as well as MEVVA sources are also introduced. 本文叙述了对材料表面改性的宽束离子源的要求，重点介绍了考夫曼型气体离子源及电子束蒸发强流金属离子源，也介绍了RF、ECR离子源及MEVVA源。
- gas ion source 气体离子源
- In addition, the requirement of delivering 18O2 beams from the electron cyclotron resonance ion source can be satisfied by the obtained 18O2 gas. 此外,制得的气体能够满足电子回旋共振离子源提供18O重离子束的实验要求。
- Because of the structure limitation, working state of the ECR ion source could not be judged by the color of gas discharging in discharge chamber. 由于受结构的限制，ECR离子源不能像高频源离子源那样通过观察气体放电的颜色判断其工作状态，所以在运行中调节状态非常困难。
- The method of experimentation is used to research the ionization efficiency in dielectric barrier discharge ion source in condition of gas s different flux. 采用实验方法研究了介质阻挡放电离子源对乙醇样品标准气在不同的流量条件下离子源电离效率的问题。
- The application of Freeman ion source linked to LC-2A ion implanter is described in the paper. 本文叙述了弗里曼(Freeman)离子源体联接在LC-2A型中能离子注入机上的应用;
- KEYWORDS : GIMS, ion source, anode layer, sputtering, TiN, ion plating, medium frequency, pulsed DC. 中文关键词：气离溅射、离子源、阳极层流、溅射、氮化钛、离子镀膜、中频、脉冲直流。
- 2 large rectangular gas ion sources (no grid no filament) near the front door for maintenance convenience to provide ionized gasses for better chemical reactive deposition with 4 MS sources (MS1-4). 2个全长的（无栅无灯丝）长方形气体离子源安装在前门两边（便于日常维护），为4个磁控靶(MS1-4)更好地进行化学反应沉积提供离化的反应气体。
- KEYWORDS: GIMS, ion source, anode layer, sputtering, TiN, ion plating ， medium frequency, pulsed DC. 中文关键词：气离溅射、离子源、阳极层流、溅射、氮化钛、离子镀膜、中频、脉冲直流。
- An intense ECR ion source for ADS (accelerator driven sub-critical system) is described. 介绍了正在研制的一台强流ECR离子源。
- The MC-SNICS ion source of NEC compact AMS system at the AMS laboratory of Peking University was upgraded recently. 摘要为提高样品测量效率，对MC-SNICS多靶位铯溅射负离子源进行了升级改进。
- Electric field of the emission system of a liquid metal ion source was simulated, based on the conventional dynamic protrusion model and the widely used charge simulation method. 摘要发射系统是液态金属离子源的关键部件之一，它的性能的优劣直接影响到整个离子源的工作稳定性和可靠性。
- Then the corresponding sigma matrix is given to further estimate the beam emittance extracted from electron cyclotron resonance ion source. 用旋转矩阵和聚焦矩阵重新推导了总的传输矩阵。
- Abstract The MC-SNICS ion source of NEC compact AMS system at the AMS laboratory of Peking University was upgraded recently. 摘要 为提高样品测量效率，对MC-SNICS多靶位铯溅射负离子源进行了升级改进。
- The purpose of the first part of this work has been to use an electromagnet to improve the performance of the Kaufman ion source. 电浆的电子，离子密度与温度是了解电离层结构的几个重要参数，而为了量测这些参数，科学家使用了数种实地量测的技术。
- A new electron impact storage ion source has been designed for time of flight mass spectrometers with a high mass resolving power and high sensitivity. 电子轰击存贮型脉冲离子源是为高分辨率、高灵敏度飞行时间质谱仪设计的新型离子源。
- Some key problems such as pre-bunching between the ion source and the RFQ, H-minus Lorentz stripping in the medium energy cyclotron, flat-top acceleration etc. have been studied. 对其中的一些关键性问题如从离子源到RFQ的预聚束问题等进行了较为深入的研究。
