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- The high quality DLC films were successfully deposited on the surface of silicon substrates at room temperature by the filtered cathodic arc plasma(FCAP) equipment. 利用自行研制的磁过滤等离子体技术(FCAP),并创造性地对衬底施加低频率周期性负偏压,在室温下的单晶硅表面上制备了高质量的非晶金刚石薄膜。
- Filtered Cathodic Arc Plasma Source and Thin Film Deposition 磁过滤的阴极弧等离子体源及其薄膜制备
- Preparation and Micro-mechanical Behavior of TiN Thin Films Deposited by Filtered Cathodic Arc Plasma Method 磁过滤阴极弧法TiN薄膜的制备及其微观机械性能研究
- filtered cathodic arc plasma 磁过滤等离子体
- Effect of substrate bias on high quality DLC films deposited by filtered cathode arc plasma 偏压类型对磁过滤等离子体制备优质类金刚石膜的影响
- Abstract This article describes three patent samples which represent the state of the art of cathodic arc plasma depisition in recent years, and gives some summaries. 本文介绍了三件阴极电弧沉积的专利。这些专利代表了近年来阴极电弧沉积技术的发展状况,并给予简要的一些评论。
- Super hard, thick DLC multilayer films has been investigated by filtered cathodic vicuum arc deposition, FCVA technology. 采用过滤真空阴极直流弧源(FilteredCathodic Vicuum Arc Deposition;FCVA)方法沉积超硬(>6000HV)超厚(微米级)的DLC/DLC多层薄膜.
- Direct current metal filtered cathodic vacuum arc(FCVA) and acetylene gas(C_2H_2) are wielded to synthesize amorphous carbon films on Si(100). 采用直流金属磁过滤阴极真空弧(FCVA)制造出Ti和乙炔(C2H2)气体的双等离子体在单晶硅(100)上制备非晶态碳膜.
- Amorphous diamond(a-D) films deposited by filtered cathodic vacuum arc(FCVA) technology with different substrate bias were investigated. 采用过滤阴极真空电弧技术,通过施加不同衬底偏压制备了非晶金刚石薄膜。
- Studies on Hydrogen-free Diamond Like Carbon Film by Filtered Cathode Arc Deposition 无氢类金刚石薄膜的过滤式阴极电弧沉积
- filtered cathodic vacuum arc (FCVA) 磁过滤阴极真空弧源
- Amorphous diamond films deposited on n-type Si (100) and samarium-on-silicon (Sm-on-Si) substrates are fabricated by a cathodic arc process. 因非晶钻石具有负的电子亲和力,故可用来研究其场发射的特性。
- filtered cathodic vacuum arc deposition 磁过滤阴极弧沉积
- Cathodic arc ion plating (CAIP) has been widely applied in modern technology field. 多弧离子镀在现代科技领域中有着广泛的应用。
- The companies use the coating technology for the world's leading technology, quality filter cathodic vacuum arc as FCVA coating technology is an international advanced coating technology. 本公司所运用的镀膜技术为全球领先技术,采用滤质阴极真空电弧镀膜技术简称FCVA技术是一种国际上先进的镀膜技术。
- Filtered cathodic vacuum arc ( FCVA) 磁过滤直流阴极真空弧源
- DLC films are deposited onto pure titanium diaphragms of excellant quality and appearance by cathodic arc deposition technique. 在制备品质及外观兼优的纯钛振膜的基础上,利用阴极电弧沈积技术在钛膜沈积类金刚石(DLC)膜层。
- Diamond films were deposited by means of the high current extended DC arc plasma CVD technique. 并在浸蚀过的硬质合金衬底上,用强电流直流伸展电弧等离子体CVD法沉积金刚石涂层。
- Filtered cathodic vacuum arc source 磁过滤直流阴极真空弧源