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- The continuous SiC fibers coated with B 4C using chemical vapour deposition(CVD) were made. 采用化学气相沉积 (CVD)方法 ,在连续SiC纤维表面沉积一层B4C涂层。
- Developments of diamond films by plasma chemical vapour deposition are reviewed in the paper. 本文评述了化学气相沉积法制备人造金刚石薄膜的进展情况。
- This paper reviews comprehensively the recent development of amor- phous silicon films fabricated by light induced chemical vapour deposition(LCVD). 本文较系统地评述了光诱导化学汽相淀积(LCVD)技术淀积非晶硅薄膜的开发现;
- Thin film of tellurium was prepared by chemical vapour deposition on the polyethylene foils using room-temperature decomposition of electrochemically generated hydrogen telluride. 用化学气相沉积法制备碲薄膜,其步骤为:通过电化学方法制得碲化氢,碲化氢在室温下分解后在聚乙烯塑料箔上沉积得到碲薄膜。
- TiO 2 thin films were prepared by chemical vapour deposition(CVD) with the source of tetra iso propyl titanate (Tiliso OC 3H 7) 4,TPT) and its optical properties are studied. 以四异丙醇钛（简称TPT）为钛源物质，采用常压化学气相沉积（CVD）法制备了TiO2膜，并对其光学性质进行了研究。
- New advance in chemical vapour deposition(CVD) , physical vapour deposition(PVD) .surfacemodification technology and other new technology in surface treatment were reviewed. 简要地评述了化学气相沉积(CVD)、物理气相沉积(PVD)、表面改性技术和其它表面处理技术的新进展。
- The two major techniques used are Chemical Vapour Deposition (CVD) and Physical Vapour Deposition (PVD).These can result in the deposition of two-dimensional blanket or patterned thin films. 因此本实验中将凹形及矩形之铜箔以叠加方式组合成一电极群，并藉由微细放电加工方法加工出具有数十道槽状的微细散热片。
- The vapour generator for chemical vapour deposition plants allows the extraction of vapours. 用于化学汽相沉积器的蒸汽发生器允许蒸汽抽提。
- Physical and chemical vapour deposition 物理、化学气相沉积
- chemical vapour deposition ( CVD ) 化学气相沉积法（CVD）
- chemical vapour deposition (CVD) 化学气相沉积
- thermally activated chemical vapour deposition 热活化化学气相沉积
- low pressure chemical vapour deposition 低压化学气相沉积
- laser chemical vapour deposition (LCVD) 激光化学气相沉积
- Metal Organic Chemical Vapour Deposition(MOCVD) 金属有机化学汽相沉积
- plasma enhanced chemical vapour deposition 等离子体增强化学沉积
- plasma enhanced chemical vapour deposition (PCVD) PCVD
- plasma-enhanced chemical vapour deposition (PE-CVD) 等离子体增强化学气相沉积（PE-CVD）
- plasma activated chemical vapour deposition 等离子体化学气相沉积
- plasma chemical vapour deposition (PCVD) 等离子体化学气相沉积
