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- Sirtl etchant 色托侵蚀液
- Perchloride of iron used to etch gravure cylinders. Alernative term: etchant. 中义腐蚀凹版辊筒的高氯酸铁。
- The feasibility of Confined Etchant Layer Technique(CELT) has been studied. 本文对用于三维超出图形复制加工的约束刻蚀剂层技术进行了可行性研究。
- The etchant penetrates between the fine grains to etch the plate forming countless tiny cells that print in a soft texture. 腐蚀剂在微粒间渗入,把版面腐蚀,造成无数小窝,印出一个柔和纹理。
- Injury may result if the etchant is allowed to remain on the skin or mucosa for extended periods of time. 如果延长酸蚀剂保留在皮肤或粘膜上的时间则会引起伤害。
- Hydrofluoric acid of Porcelain Etchant and phosphoric acid of UNI-ETCH are severe eye and tissue irritants. 瓷酸蚀剂的氢氟酸和UNI-ETCH的磷酸是一种强烈的眼睛和组织的刺激物。
- The effects of composition of etchant, etching temperature and etching time on etching rate are also investigated. 通过研究刻蚀剂组份、刻蚀时间、刻蚀温度对刻蚀速率的影响,可提供合适的刻蚀剥层方案。
- It is also used as the etchant for etching Aluminum and Silicon Nitride film in semi-silicon IC. 在硅平面晶圆集成电路生产中,用于铝及氮化硅的蚀刻;
- Transene Co. Inc., "Materal safety data sheet for aluminum etchant type A", Transene Co. Inc., Rowley, MA, 1987. 李世鸿,"积体电路制程技术",五南图书出版公司,民国87年10月。
- Rinse with copious amounts of water to remove etchant and air dry.The etched surface may appear dull and frosty. 用大量的水充分地冲洗酸蚀液,并且用空气枪干燥。被腐蚀过的表面有些许会出现晦暗和浑浊。
- Experiments further show that the continuous regeneration of acidic copper etchant can be achieved and a high cop... 实验进一步证实,一套以BDD电极为核心的装置可以实现蚀铜液连续再生,并能维持高蚀铜速度。
- Comparing with different chemical etchant, FPM(HF-H2O2-H2O Mixing) can reach a high selectivity of Sion/SiO2. 通过不同腐蚀药液的比较,结果表明,FPM(HF- H2O2-H2O混合液)能够达到氮氧化硅对氧化硅较高的选择比。
- More often, all of the materials exposed to the etchant have a finite etch rate. 通常,所有暴露在刻蚀剂中的材料都具有一定的刻蚀速率。
- Resist: Coating material used to mask or to protect selected areas of a pattern from the action of an etchant, solder, or plating. 阻剂:用来选择性保护某图形区域免受蚀刻剂,焊料或电镀影响的涂层材料。
- Electrochemical etching of single crystal GaAs (111) was performed with pyramid-like microstructure arrays by confined etchant layer technique (CELT). 以“金字塔”状的锥体阵列作为电化学模板,利用约束刻蚀剂层技术对半导体GaAs进行加工刻蚀。
- The chemical microetching on copper surface with three-dimensional(3D) gear-like molds was realized by confined etchant layer technique(CELT). 运用约束刻蚀剂层技术 (CELT)在金属铜 (Cu)表面实现了三维微图形加工 ,取得成功的关键因素在于寻找到能对Cu进行有效CELT加工的化学刻蚀和捕捉体系。
- During copper etching,the cuprous ion concentration in the etchant would increase which causes an etching rate reduction. 随着蚀铜过程的进行,蚀铜液中的一价铜离子浓度不断增加,造成蚀铜液的蚀铜能力下降。
- Thesilicon - rich layer is etched by BOE etchant and photolithographicprocedure are being described initiately in this paper. 作者首次描述利用常规光刻技术,用BOE腐蚀液刻蚀双层氧化硅层。
- If the etchant is accidentally splashed into the eye, flush with copious amounts of water and seek medical attention immediately. 如果意外的溅到眼睛,立即用大量的水冲洗并寻求医疗帮助。
- The room to place blower should be in dry condition with excellent ventilation,no etchant gas and can prevent from drench and solarization. 风机的存放空间应干燥通风,无腐蚀气体,并能防止雨淋和日晒!