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- This thesis considers the delamination behaviors between substrate and molding compound for Ball Grid Array (BGA) products caused by the plasma etching process. 中文摘要本文针对阵列锡球封装产品基板和胶饼间所产生的分层作研究。
- The Principle and Methods of Cleaning Noxious and Corrosive Gases in Plasma Etching Process 等离子体刻蚀过程中有害气体净化的原理和方法
- Plasma etching process 等离子体刻蚀
- I plant mainly in metal etching process. 我厂主要以金属蚀刻加工。
- Homogeneous microstructure which is most suitable for the etching process. 组织均匀,最适用于精密蚀花加工。
- The reactor is capable of working in the RIE (reactive ion etching) mode and also in the plasma etching mode. 反应腔拥有在RIE(反应离子刻蚀)模式和等离子刻蚀模式下工作的能力。
- Aquatint:It is an etching process on copper or steel by means of nitric acid. 水彩色调:用硝酸在钢片或铜片上作腐蚀的蚀刻法。
- To approach as a resist in dry etching processing, etching properties of the films in oxygen plasma have been investigated. 为了探索该种薄膜在干刻蚀工艺过程中用作掩膜的可能性,还研究了它在氧离子体中的刻蚀性能。
- John has been trying to develop a new etching process for months and he's finally struck oil. 约翰已花了几个月的时间来创造一种新的蚀刻工序,他最终获得了成功。
- Diagnostic test with Langmuir probe of the electron cyclotron resonance (ECR) plasma source was modified to evaluate our lab-built ECR plasma etching system. 摘要电子迴旋共振(ECR)等离子体以其密度高、工作气压低、均匀性好、参数易于控制等优点在超大规模集成电路工艺中获得了广泛的应用。
- The resolution of an etching process is a measure of the fidelity of pattern transfer. 刻蚀工艺的分辨率是图形转移保真度的量度。
- Diagnostic test with Langmuir probe of the electron cyclotron resonance (ECR) plasma source was modified to evaluate our lab built ECR plasma etching system. 电子回旋共振(ECR)等离子体以其密度高、工作气压低、均匀性好、参数易于控制等优点在超大规模集成电路工艺中获得了广泛的应用。
- The lithographic and etching process for a membrane creates a mesh of metal wires with silicon dioxide filling the space between them. 薄膜先以微影及蚀刻制程制作出金属线路,线路之间则填入二氧化矽。
- Using patented technology: acid etching process to make the blade of graters sharper. 本版权所有中华经贸网,任何人未经同意不得擅自引用!
- We fabricate desired structured surfaces by holographic lithography, plasma etching and Teflon coating.The performance is evaluated by measuring the reflectance spectrum and contact angle. 实验上,我们采用全像微影术、电浆蚀刻以及旋镀铁氟龙的方式来制作试片,并量测该试片的反射频谱和接触角。
- The ion beam etching process in fabricating refractiue microlens is simulated by setting up the etching model of Argonion beam to resist microlens. 建立氩离子束对光刻胶微透镜的刻蚀模型,模拟折射微透镜制备中的离子束刻蚀工艺过程。
- Abstract: The characteristics and progress of lithography technique and plasma etching technology are summarized.Their physical mechanisms and current research problems are also explained. 文摘:介绍了光刻与等离子体刻蚀技术的特点与进展,阐述了等离子体刻蚀的物理机制与前沿问题.
- In order to modify the defect of metal mask, we propose to use TMAH anisotropic wet etching process to fabricate thin silicon shadow masks. 为了改善金属遮罩的缺点,我们使用非等向湿蚀刻的方式用(100)矽晶片制作矽材料蒸镀遮罩。
- An in-situ particle monitor was installed on a plasma etch tool chamber.This article includes a discussion of two major problems detected on the plasma etch tool within a three-week period. 在等离子体蚀刻工具主舱内安装一个现场粒子监测器,对两个主要问题进行了三周的测试并展开了讨论。
- Aquatint:It is an etching process on copper or steel by means of nitric acid. In this technique, a thin layer of resin dust is sprinkled on the plate and heated to make it adhere. 水彩色调:用硝酸在钢片或铜片上作腐蚀的蚀刻法。这个技巧是在版面上洒上一层薄薄的树脂粉,加热把它粘附于版面。