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- A new method for testing the acid etching depth of WC-Co cemented carbide by flame atomic absorption spectrometry and glow discharge spectrometry has been studied. 研究了原子吸收光谱法和辉光放电光谱仪定量测定硬质合金去钴深度的新技术。
- AN ACCESSORY OF GLOW DISCHARGE SPECTROMETRY FOR SMALL SIZE SAMPLE 一种用于辉光放电光谱分析小件试样的附件
- Application of glow discharge spectrometry in analysis of galvanized steel sheet 辉光放电光谱法分析镀锌钢板产品
- Glow discharge spectrometry 辉光放电光谱仪
- The basic principle of glow discharge mass spectrometry (GDMS) was briefly introduced. 摘要简单介绍了辉光放电质谱(GDMS)的基本原理。
- Simultaneous multielement determination for superalloy by glow discharge optical emission spectrometry (GDOES) was investigated. 研究了用辉光光谱法(GDOES)同时测定高温合金中的多种元素的含量。
- This paper comments on the recent advances of inductively coupled plasma mass spectrometry(ICP-MS) and glow discharge mass s pectrometry(GDMS). 本文评述了近几年来电感耦合等离子体质谱仪(ICP-MS)和辉光放电质谱仪(GDMS)的发展。
- The simplest discharge to produce is the glow discharge. 最简单的放电产生方法是辉光放电。
- The analyzed results indicate that it is abnormal glow discharge. 分析表明,放电处于异常辉光区。
- HEAVY PARTICLE TRANSPORT PROCESS IN CATHODE SHEATH OF NITROGEN GLOW DISCHARGE? 氮气辉光放电阴极鞘层重粒子输运过程研究?
- This paper introduces the arc added glow discharge ion titanizing technique. 采用双层辉光离子渗金属技术对纯铜进行了渗钛处理。
- glow discharge mass spectrometry 辉光放电质谱法
- glow discharge optical emission spectrometry 辉光放电光谱法
- Glow discharge emission spectrometry 辉光放电光谱法
- Ion species and their energy in the cathode sheath of N 2 abnormal glow discharges with short electrode interval were determined by molecular beam mass spectrometry (MBMS). 利用国内首台三级差分抽空的分子束质谱装置;对短间隙氮异常辉光放电阴极鞘层区正离子组分及能量分布进行了诊断研究.
- Atmospheric glow discharge in air is produced difficultly due to that the discharge is transited easily to spark discharge. 摘要空气中的大气压辉光放电通常因放电易过渡到火花状态而难以产生。
- Electric discharge characterized by a cathode fall that is small compared with that in a glow discharge. 与辉光放电相比,阴极位降相对较低的放电形式。
- The samples were deposited on c-Si substrates by glow discharge inH_2 and SiCl_4 mixture. 样品是在H_2和SiCl_4混合气体中用辉光放电方法淀积在晶体硅(c-Si)衬底上的.
- DLC and a-SiC:H films were prepared by the rf glow discharge and the reactive sputtering method respectively. 本文分别采用射频(13.;56MHz)等离子体CVD及射频反应溅射方法制得了DLC及a-SiC：H薄膜。
- Pai S T. Analytic approach to glow discharge theory: the physical model [J]. J.Appl.Phys. , 1992, 71(12): 5820. 郭小明;周庭东;白秀庭.;辉光放电等离子体理论模型的建立[J]
