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- Deposition of High Quality GaN Film Under High ECR Plasma Density ? 在高ECR 等离子体密度下沉积高质量氮化镓薄膜(英文)
- Key words: ECR plasma;magnetic field;fluid model;numerical simulation. 作者简介:段萍（1962-），女，教授，主要研究方向：光电、等离子体物理学
- Because of high density,high ionization,low pressure and small damage,ECR plasma can bewidely used in RIE,Plasma CVD and Sputtering. 由于ECR微波等离子体技术具有密度高、电离度大、工作气压低、表面损伤小等特点，在反应离子刻蚀（RIE）、等离子体化学气相淀积（CVD）和溅射方面具有广阔的应用前景。
- The results show that the ECR plasma source may generate stable, high density plasma with low electron temperature. 实验证明，ECR等离子体源能够稳定地产生电子温度较低的高密度等离子体。
- In this paper, we fulfill this aim by using an ECR plasma source to create the plasma. 本研究利用ECR等离子体源在一个大型真空装置中来实现模拟低地球轨道空间等离子体环境。
- The silicon thin films on glass substrate were prepared using microwave ECR plasma source enhanced magnetron sputtering. 摘要利用微波ECR等离子体增强磁控溅射沉积技术在玻璃表面制备了矽膜。
- Diagnostic test with Langmuir probe of the electron cyclotron resonance (ECR) plasma source was modified to evaluate our lab-built ECR plasma etching system. 摘要电子迴旋共振(ECR)等离子体以其密度高、工作气压低、均匀性好、参数易于控制等优点在超大规模集成电路工艺中获得了广泛的应用。
- Diagnostic test with Langmuir probe of the electron cyclotron resonance (ECR) plasma source was modified to evaluate our lab built ECR plasma etching system. 电子回旋共振(ECR)等离子体以其密度高、工作气压低、均匀性好、参数易于控制等优点在超大规模集成电路工艺中获得了广泛的应用。
- ECR plasma source consists of electrical soure,deflation system,air feed system,electron tube etc.For study purpose,It also includes a measurement &control system. ECR等离子源主要由电源系统、抽气系统、供气系统、真空室等设备组成,对于研究型设备,还包括测控部分。
- The non-stoichiometry semi-conductive indium oxide films were prepared on glass surface using magnetron-sputtering deposition synchro-enhanced by microwave ECR plasma soure ion-implantation. 利用微波电子自旋共振等离子源离子注入增强沉积法在玻璃表面制备了非化学计量半导体氧化铟膜。
- Etching Techniques by an ECR Plasma Source 电子回旋共振等离子体的刻蚀技术
- Study of Microwave ECR Plasma Propagating Property 微波ECR等离子体的传播特性研究
- ECR Plasma Nitriding of Iron Based Materials ECR微波等离子体氮化铁基材料的参数研究
- ECR Plasma Sources for Ionosphere Environment Simulator 用于电离层环境模拟器的ECR等离子体源
- Deposition of High Quality GaN Film Under High ECR Plasma Density 在高ECR等离子体密度下沉积高质量氮化镓薄膜
- Calculation of Electron Power Absorption in Microwave ECR Plasma 微波ECR等离子体中的电子能量吸收的计算
- INVESTIGATION OF MATERIALS PROCESSED WITH THE MICROWAVE ECR PLASMA 微波ECR等离子体材料加工技术研究
- ITO Thin Film Deposition by ECR Plasma Enhaced Reactive Evaporation 微波ECR等离子体辅助反应蒸发沉积ITO膜
- THE INVESTIGATION OF GaN FILM DEPOSITION IN ECR PLASMA 在ECR等离子体中GaN薄膜沉积的研究(英文)
- A plasma globulin of high molecular weight. 大球蛋白细胞分子中较重的血球蛋白
