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- plasma etch mask 等离子腐蚀用掩模
- An in-situ particle monitor was installed on a plasma etch tool chamber.This article includes a discussion of two major problems detected on the plasma etch tool within a three-week period. 在等离子体蚀刻工具主舱内安装一个现场粒子监测器,对两个主要问题进行了三周的测试并展开了讨论。
- The reactor is capable of working in the RIE (reactive ion etching) mode and also in the plasma etching mode. 反应腔拥有在RIE(反应离子刻蚀)模式和等离子刻蚀模式下工作的能力。
- This paper introduces a method of deep etching of PYREX 7740 glass by one-time lithographing,multiple hardening and etching with Cr and BP-212 photoresist as etching mask. 本文对PYREX 7740玻璃湿法刻蚀进行研究,提出了利用铬膜和光刻胶作为掩膜,进行一次光刻、多次坚膜、多次腐蚀的工艺方法。
- Plasma Etch Advanced Process Control ( In-situ Endpoint Detectors ) 等离子刻蚀过程控制(在线终点探测器)
- The proposed methodologies are applied to detection and classification faults for a particular tool function of a plasma etcher in semiconductor fabrication. 针对所提出的方法，实际应用于半导体制造之电浆蚀刻的机台参数的错误侦测及鑑别，并得之验证。
- Diagnostic test with Langmuir probe of the electron cyclotron resonance (ECR) plasma source was modified to evaluate our lab-built ECR plasma etching system. 摘要电子迴旋共振(ECR)等离子体以其密度高、工作气压低、均匀性好、参数易于控制等优点在超大规模集成电路工艺中获得了广泛的应用。
- This thesis considers the delamination behaviors between substrate and molding compound for Ball Grid Array (BGA) products caused by the plasma etching process. 中文摘要本文针对阵列锡球封装产品基板和胶饼间所产生的分层作研究。
- He wore a mask so that no one should recognize him. 他戴了一个面罩，使别人认不出他来。
- Diagnostic test with Langmuir probe of the electron cyclotron resonance (ECR) plasma source was modified to evaluate our lab built ECR plasma etching system. 电子回旋共振(ECR)等离子体以其密度高、工作气压低、均匀性好、参数易于控制等优点在超大规模集成电路工艺中获得了广泛的应用。
- Sham is sham and the mask must be stripped off. 假的就是假的，伪装应当剥去。
- We fabricate desired structured surfaces by holographic lithography, plasma etching and Teflon coating.The performance is evaluated by measuring the reflectance spectrum and contact angle. 实验上，我们采用全像微影术、电浆蚀刻以及旋镀铁氟龙的方式来制作试片，并量测该试片的反射频谱和接触角。
- He tried to mask his disappointment with a smile. 他试图以微笑来掩饰他的失望。
- The mask fitted tightly over his face. 他用面具把脸蒙得严严的。
- Abstract: The characteristics and progress of lithography technique and plasma etching technology are summarized.Their physical mechanisms and current research problems are also explained. 文摘:介绍了光刻与等离子体刻蚀技术的特点与进展，阐述了等离子体刻蚀的物理机制与前沿问题.
- They did so under the mask of charity. 他们是打着慈善的幌子这么做的。
- A plasma globulin of high molecular weight. 大球蛋白细胞分子中较重的血球蛋白
- Keywords inorganic non-metallic materials;diamond thick films;plasma etch;grain boundary;abradability; 无机非金属材料;金刚石厚膜;等离子体刻蚀;晶界;耐磨性;
- Such feelings tend to remain submerge beneath a mask of social politeness. 在社交礼貌的掩盖下，这样的情感往往不会显露出来。
- It must have taken a lot of time to etch that. 蚀刻这个图案一定花了不少时间。
