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- InGaN Films Grown by Metalorganic Chemical Vapor Deposition[J]. 引用该论文 江风益;李述体;王立;彭学新;熊传兵.
- Heavy Carbon Doping of GaAs by Metalorganic Chemical Vapor Deposition[J]. 引用该论文 李宝霞;汪韬;李晓婷;赛小锋;高鸿楷.
- Blue-laser DVD formats are happening now.All these materials are mainly produced by metalorganic chemical vapor deposition (MOCVD) technology. 而蓝光DVD规格的雷射也即将如此，这些所有材料主要是利用金属氧化物化学气相磊晶(MOCVD)技术所制成的。
- Iridium films were prepared by using metalorganic chemical vapor deposition (MOCVD) of iridium tri(acetylacetonate) without oxygen or other gas reactants. 在不通入活性气体的条件下,采用三乙酰丙酮铱金属有机物化学气相沉积方法制备铱薄膜。
- At present the prevailing epitaxial growth techniques of GaN are Metalorganic Chemical Vapor Deposition (MOCVD), Molecule Beam Epitaxy (MBE) as well as HVPE. 目前GaN的外延生长技术一般采用有机金属化学气相外延法(MOCVD)，在蓝宝石衬底的(0001)面上外延生长GaN材料，另外还有分子束外延技术(MBE)及卤化物汽相外延技术(HVPE)等。
- Thin SiN layers and nitride-based multiquantum well( MQW) light emitting diode( LED) structures with conventional single GaN buffer and GaN/ SiN double buffers were grown on sapphire substrates by metalorganic chemical vapor deposition( MOCVD). 摘要以有机金属化学气象沉积在蓝宝石基板上成长由单一氮化镓成核层与氮化镓/化硅双缓冲层所形成的两种不同氮基础的多层量子井发光二极体结构。
- Thin SiN layers and nitride-based multiquantum well (MQW) light emitting diode (LED) structures with conventional single GaN buffer and GaN/SiN double buffers were grown on sapphire substrates by metalorganic chemical vapor deposition (MOCVD). 摘要以有机金属化学气象沉积在蓝宝石基板上成长由单一氮化镓成核层与氮化镓/氮化矽双缓冲层所形成的两种不同氮基础的多层量子井发光二极体结构。
- InP/GaAs 0.5 Sb 0.5 /InP DHBT (double heterojunction bipolar transistor) is grown by MOCVD (metalorganic chemical vapor deposition). The influence of material quality on device performance is studied. 采用金属有机化学气相沉积生长了 In P/ Ga As0 .;5Sb0
- Metalorganic chemical vapor deposition (MOCVD) 金属有机物化学气相沉积
- metalorganic chemical vapor deposition Raman散射
- metalorganic chemical vapor deposition(MOCVD) 金属有机物化学气相沉积（MOCVD）
- Keywords iridium;metalorganic chemical vapor deposition;precursor;substrates; 铱;金属有机物化学气相沉积;先驱体;基片;
- Focused Ion Beam Induced Metalorganic Chemical Vapor Deposition of C-Pt Thin Film 聚焦离子束诱发金属有机化学气相淀积碳-铂薄膜
- Keywords metalorganic chemical vapor deposition;Y_2O_3 coating;Y（TMHD）3;equipment; 金属有机化学气相沉;氧化钇涂层;Y（TMHD）_3;设备;
- Keywords second harmonic generation;metalorganic chemical vapor deposition （MOCVD）;second order susceptibility;third order susceptibility;deposition temperature; 二次谐波振荡;金属有机化学气相沉积;二阶极化率;三阶极化率;沉积温度;
- metalorganic chemical vapor 有机金属化学蒸气
- A metalorganic organic chemical vapor deposition reactor is also disclosed utilizing a susceptor according to the present invention. 还揭示了采用根据本发明的衬托器的有机金属化学汽相沉积反应器。
- Produce a chemical vapor to be inhaled in order to relieve nasal congestion. 制造为了减轻鼻子充血的供吸入的化学水蒸气。
- A chemical vapor deposition process that takes place at moderate temperatures. 一种化学汽相淀积过程,发生在适度的温度下。
- Ultrathin organosilicon films were synthesized by chemical vapor deposition. 用化学气相沉积方法制备了超薄有机硅膜。
