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- The ZrN films were deposited by RF magnetron reactive sputtering system. 使用反应性磁控溅镀系统成长氮化锆薄膜。
- Aluminum nitride (AIN) thin films have been successfully deposited on Si(100) and Pt/Ti/Si(100) by DC magnetron reactive sputtering. 采用直流磁控反应溅射法,在Si(100)和Pt/Ti/St(100)上制备了具有较好(002)择优取向性的AlN薄膜。
- S. B. Krupanidhi and M. Sayer,”Position and Pressure Effects in RF Magnetron Reactive Sputter Deposition of Piezoelectric Zinc Oxide” ,J.Appl.Phys.,vol. 56,pp. 3308,1984. 魏清梁，固态微型谐振器之压电层与反射层研制，国立中山大学电机工程研究所，硕士论文，2005.
- radio frequency(RF) magnetron reactive sputtering 射频磁控反应溅射
- DC magnetron reactive sputtering 直流磁控溅射
- RF magnetron reactive sputtering 射频磁控反应溅射
- R.F. magnetron reactive sputtering 射频磁控溅射
- Oxidation Resistance of Magnetron Reactive Sputtering CrN Films 磁控反应溅射沉积CrN薄膜的抗氧化性研究
- Plasma magnetron reactive sputter deposition technique 磁控反应溅射技术
- AlN Piezoelectric Thin Film Prepared by Reactive Magnetron Reactive Sputtering 衬底温度对反应磁控溅射制备AlN压电薄膜的影响
- Effect of Technical Parameters on Deposition Rate of AlN Films Prepared by Magnetron Reactive Sputtering 工艺参数对磁控反应溅射AlN薄膜沉积速率的影响
- Study of Processing and Properties of AIN Films Prepared by Magnetron Reactive Sputtering 磁控反应溅射AIN薄膜的制备工艺与性能研究
- Keywords RF magnetron reactive sputtering;Buffer layer;Surface morphology;Electrical resistivity;Fluorescence spectrum; 射频磁控反应溅射;缓冲层;表面形貌;电阻率;荧光光谱;
- Keywords magnetron reactive sputtering;solar selective absorbing surface;solar absorptance;emittance;interference effect; 磁控反应溅射;选择性吸收;太阳吸收比;发射率;干涉作用;
- magnetron reactive sputtering 磁控反应溅射
- Keywords Sapphire;Infrared;Antireflective and Protective Thin Film;Silicon Dioxide;Silicon Nitride;Radio Frequency Magnetron Reactive Sputtering;Rain Erosion Test;High Temperature Strength; 蓝宝石;红外;增透保护膜;氧化硅;氮化硅;射频磁控反应溅射;雨蚀试验;高温强度;
- BCN thin films were grown by RF reactive sputtering. 用射频反应溅射法制备出 BCN薄膜 .
- DLC and a-SiC:H films were prepared by the rf glow discharge and the reactive sputtering method respectively. 本文分别采用射频(13.;56MHz)等离子体CVD及射频反应溅射方法制得了DLC及a-SiC：H薄膜。
- Up to now reported NiOx coating are usually produced by rf reactive sputtering or electron beam reactive evaporation (BEV). 已报道的NiOx薄膜常用金属镍的射频反应溅射或电子束反应蒸发方法制备。
- Transparent and conductive oxides CdIn 2O 4 (CIO) thin films were prepared by RF reactive sputtering from a Cd-In alloy target in Ar+O 2 atmosphere. 在Ar+O2 气氛 ;采用射频反应溅射Cd In靶制备CdIn2 O4 (CIO)薄膜 .
