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- magnetron ion etcher 磁控管离子腐蚀装置
- The influence of chamber pressure,gas flow rate and RF power on micro loading effect in reactive ion etch of silicon dioxide is researched. 结果表明,通过对反应室压力、刻蚀气体流量和射频功率的调节,可以降低微负载效应的影响,得到良好的刻蚀均匀性。
- The reactor is capable of working in the RIE (reactive ion etching) mode and also in the plasma etching mode. 反应腔拥有在RIE(反应离子刻蚀)模式和等离子刻蚀模式下工作的能力。
- Yak hairs were treated by the microwave electron cyclotron resonance plasma reactive ion etching (ECR-RIE) equipment to improve its property of weave. 摘要采用微波电子回旋共振等离子体反应离子刻蚀(ECR-RIE)装置对牦牛毛纤维进行表面改性，从而改善牦牛毛的可纺性。
- The experiment of fully automatic reactive ion etching on 3 inch GaAs wafer is described. 介绍了全自动反应离子腐蚀3英寸GaAs片的实验研究工作。
- The arrays were subsequently treated with reactive ion etching (RIE) to slightly reduced the size of the sphere. 制程的开发首先利用黄光微影制作有高低差的沟槽图样，再将单层奈米球排入沟槽之中。
- Reactive ion etching (RIE) process utilized to form giant magnetoresistive (GMR) spin valve sensing elements was investigated experimentally. 对巨磁电阻自旋阀磁场传感器制作中的关键技术之一:自旋阀薄膜的反应离子刻蚀(RIE)工艺,进行了试验研究。
- Yak hairs were treated by the microwave electron cy cl otron resonance plasma reactive ion etching(ECR-RIE) equipment to improve its property of weave. 采用微波电子回旋共振等离子体反应离子刻蚀(ECR-RIE)装置对牦牛毛纤维进行表面改性,从而改善牦牛毛的可纺性。
- In the table below, if a blaze wavelength is indicated, the grating has been optimized for the indicated wavelength and has been blazed by means of ion etching. 下表中标有闪耀波长的光栅为离子刻蚀光栅,在闪耀波长处优化。
- A two-dimensional (2D) physical model of reactive ion etching (RIE) which includes isotropic and anisotropic components is presented.The physical model is analyzed. 摘要反应离子刻蚀(RIE)的二维物理模型，包括各向同性和各向异性两部分。
- The electron backscatter diffraction technique (EBSD) has been used to measure the microstructure of reactive ion etched(RIE) Al and damascene Cu interconnects, including the grain size, grain orientation and grain boundary characteristics. 利用电子背散射衍射(EBSD)技术;测量了由反应离子刻蚀工艺(RIE)制备的Al互连线和大马士革工艺(Damascene)制备的Cu互连线的显微结构;包括晶粒尺寸、晶体学取向和晶界特征.
- Research on Etch Rate of Reactive Ion Etching of GaAs,AlAs and DBR GaAs、AlAs、DBR反应离子刻蚀速率的研究
- It must have taken a lot of time to etch that. 蚀刻这个图案一定花了不少时间。
- Study of Reaction Ion Etching Processing Technique 反应离子刻蚀加工工艺技术的研究
- Narrow gap reactive ion etching system 狭窄间隙反应性离子蚀刻系统
- This book will {etch the public! 这本书将博得大众的欢迎。
- Triode reactive ion etching system 三极型反应性离子蚀刻系统
- Etch, plana curved surface Processing Printing. 蚀刻平面,曲面印刷加工。
- This book will { etch the public! 这本书将博得大众的欢迎。
- Reactive Ion Etching of Diamond Films 金刚石薄膜的反应离子刻蚀
