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- Kraft R, et al. Biased charge collector analysis for intense ion beam measurements[J]. Appl Phys, 1987,61(6):2123. 何小平;等.;用偏压法拉第筒测量强流脉冲离子束[J]
- The simulation of ionic radial density in high intensity ion beam 强流离子束离子径向密度分布的模拟研究
- intense ion beam 强离子束
- Effect of Controllers on Ionic Radial Density of High Intensity Ion Beam 控制信息对强流离子束径向密度分布的影响
- Effect of Mismatch Factor and Tune Depression Factor on High Intensity Ion Beam 失匹配因子和调谐因子对强流离子束的影响
- It is a technique called ion beam writing. 这一技术被称为离子束刻写。
- Ion beam mutation has significant bio-effect. 摘要离子诱变具有显著的生物学效应。
- The 6 achievements on Ion Beam Bio-engineering of Low Energy were outlined. 摘要简述了低能离子束生物技术在6个主要方面的研究成果。
- Ion beam induced surface modification of polymer was extensively discussed. 介绍了运用高能离子束对聚合物材料进行表面改性的新工艺。
- Studies on physical issues of simultaneous acceleration of intense positive and negative ion beams in RFQ. RFQ同时加速强流正负离子束的物理问题研究[D].;北京:清华大学;2003
- Allison scanner for high-current ion beam emittance measurements[J]. 引用该论文 徐蓉;邹宇斌;高淑丽;郭之虞;彭士香;钱锋;赵捷.
- Antireflective film prepared by periodic ion beam assisted deposition[J]. 引用该论文 张大伟;黄元申;贺洪波;邵建达;范正修.
- high intensity ion beam 强流离子束
- A MINIATURE INTENSE PULSED ION BEAM ACCELERATOR 一台小型强流脉冲离子束加速器
- Using sintered B4C as target material, ternary BCN thin films were synthesized by means of pulsed laser deposition assisted by nitrogen ion beam. 以烧结B4C为靶材料、在氮离子束辅助下用脉冲激光沉积方法制备了三元化合物硼碳氮(BCN)薄膜。
- In addition, average angular information is taken from adjacent segments and the incident ion beam. 另外，可以从邻近线段和入射离子束取得平均角度的信息。
- The system of ion beam implantation had been established and the biological effects were primarily studied. 壮观链霉菌1043为一壮观霉素生产菌种，通过实验建立了离子注入选育壮观链霉菌。
- Streptomyces spectabilis 1043 which produces spectinomycin is implanted by N(superscript +) ion beam. 摘要利用离子注入选育高产壮观链霉菌。
- Ensinger W.Ion Source for ion beam assisted thin film deposition[J].Rev.Sci.-Instrum.1992,63(11):5217. 潘永强;朱昌;陈智利;等.;端部霍尔离子源工作特性及等离子体特性研究[J]
- We used Ebeam lithography to define the photonic crystal patterns and ion beam etcher for the etching process. 元件制作方面，我们使用电子束微影系统来定义光子晶体的图形，并用离子束蚀刻机进行蚀刻制程。
