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- high frequency ion etching 高频离子腐蚀
- Introduces the production of the high frequency fundamental-mode inverted mesa crystal resonators with ion beam etching and the application of inverted mesa crystal resonators. 介绍了应用离子束刻蚀技术制作高基频反台晶体谐振器及反台晶体谐振器的应用。
- high frequency ion source 高频离子源
- Small dissipation factor at high frequency. 高的频率和小的损耗因素.
- High Frequency Switch-mode Rectifier for. 通信用高频开关整流器。
- The reactor is capable of working in the RIE (reactive ion etching) mode and also in the plasma etching mode. 反应腔拥有在RIE(反应离子刻蚀)模式和等离子刻蚀模式下工作的能力。
- High Frequency and Temperature Stability. 高频及高温稳定。
- Linear and Stable High Frequency Characteristics. 稳定的线性高频特性。
- Yak hairs were treated by the microwave electron cyclotron resonance plasma reactive ion etching (ECR-RIE) equipment to improve its property of weave. 摘要采用微波电子回旋共振等离子体反应离子刻蚀(ECR-RIE)装置对牦牛毛纤维进行表面改性，从而改善牦牛毛的可纺性。
- Provides high Q characteristics in high frequency. 在高频率时提供高的品质因数(Q)值特性.
- The experiment of fully automatic reactive ion etching on 3 inch GaAs wafer is described. 介绍了全自动反应离子腐蚀3英寸GaAs片的实验研究工作。
- Antistatic 50W high frequency power quick clean. 防静电50W高频功率,清洗效果显著。
- The arrays were subsequently treated with reactive ion etching (RIE) to slightly reduced the size of the sphere. 制程的开发首先利用黄光微影制作有高低差的沟槽图样，再将单层奈米球排入沟槽之中。
- Dolphins produce a high frequency sound. 海豚可以发出高频音。
- Yadong High Frequency Welding Steel Manufacture CO. LTD提供钢卷和其他产品。
- Reactive ion etching (RIE) process utilized to form giant magnetoresistive (GMR) spin valve sensing elements was investigated experimentally. 对巨磁电阻自旋阀磁场传感器制作中的关键技术之一:自旋阀薄膜的反应离子刻蚀(RIE)工艺,进行了试验研究。
- Feature:low dissipation factor at high frequency. 特征：高频率，低损耗;容量稳定;自愈性能佳，适合高阻 Recommended Application: Timing, tuned, Oscillator circuits;
- Yak hairs were treated by the microwave electron cy cl otron resonance plasma reactive ion etching(ECR-RIE) equipment to improve its property of weave. 采用微波电子回旋共振等离子体反应离子刻蚀(ECR-RIE)装置对牦牛毛纤维进行表面改性,从而改善牦牛毛的可纺性。
- VHFJ? Very High Frequency Jammer? 甚高频干扰台?
- In the table below, if a blaze wavelength is indicated, the grating has been optimized for the indicated wavelength and has been blazed by means of ion etching. 下表中标有闪耀波长的光栅为离子刻蚀光栅,在闪耀波长处优化。
