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- That all ensures you can get the most davnced film deposition machine in our company . 先进的技术，保证了我公司的技术设备具有世界超一流的水准。
- The thin film deposition can control precisely the height of the step and can obtain smooth surface. 薄膜沉积法具有精确控制台阶高度及台阶表面较光滑的优点。
- Ensinger W.Ion Source for ion beam assisted thin film deposition[J].Rev.Sci.-Instrum.1992,63(11):5217. 潘永强;朱昌;陈智利;等.;端部霍尔离子源工作特性及等离子体特性研究[J]
- Recently, various magnetron sputtering lines for thin film deposition on large-size glass substrate grow rapidly and attract significant attention. 摘要近年来，各种工业生产规模的玻璃基片大平面磁控溅射生产线发展迅速，令人关注。
- DOE's fabrication techniques mainly include laser beam or electron beam writing, RIE, ion milling and thin film deposition. 衍射光学元件的制作技术主要包括激光或电子束直写、反应离子刻蚀、离子束铣及薄膜沉积。
- Under otherwise equal conditions, the film deposition ratio by UMS is higher and more influenced with working gases pressure than by MS. 相同工艺条件下，非平衡模式下薄膜沉积速率高于平衡模式，且更易受到氩气流量变化的影响。
- Progress in organic-inorganic layered perovskite materials about their structures, thin film deposition techniques and properties were summarized. 摘要概述了层状类钙钛矿有机-无机分子组装材料的结构、成膜方法以及性能的研究进展，并分析了影响其结构和性能的部分因素。
- These excellent abilities can be contributed to the mechanism of saturated chemi-sorption and self-limiting film deposition, which differs from traditional deposition technology. 这些杰出的能力可归功于跟传统镀膜技术不一样的饱和化学吸附与自我限制的镀膜机制。
- Focused Ion Beam is an advanced micro/nano technology for figure observation, orientation making-sample, component analysis, film deposition and maskless etching. 聚焦离子束技术是一种集形貌观测、定位制样、成份分析、薄膜淀积和无掩模刻蚀各过程于一身的新型微纳加工技术。
- Magnetron sputtering is a widely used method for thin film deposition in recent years,which makes a great impact on the industrial production and scientific research. 近年来磁控溅射技术的应用日趋广泛,在工业生产和科学研究领域发挥巨大作用。
- Study of Silicon Oxynitride Film Deposited by RF Magnetron Sputtering[J]. 引用该论文 朱勇;顾培夫;沈伟东;邹桐.
- The results show that this proposed model is suitable for simulating the film deposition in LPCVD reactor under various TEOS feed flow rate, wafer production rate and machine platform. 最后由模拟结果可以得知，本文所提出的物理模式可应用于不同的反应晶圆片数、不同的反应物进料流量和不同的操作机台上。
- The relation between characteristics of hot cathode glow discharge and diamond film deposition techniques in hot cathode glow discharge plasma chemical vapor deposition process was discussed. 研究了在热阴极辉光放电等离子体化学气相沉积金刚石膜过程中,热阴极辉光放电特性与金刚石膜沉积工艺的关系。
- FIB(Focused Ion Beam) is an advanced micro/nano technology for morphological observation,sample-making for accurate positioning,compositional analysis,film deposition and maskless etching. 聚焦离子束(FIB)技术是一种集形貌观测、定位制样、成份分析、薄膜淀积和无掩模刻蚀各过程于一身的新型微纳加工技术。
- That was infinitely better than his last film. 这比他上一部电影不知胜过多少倍。
- High-pressure glow discharge has many applications such as surface modification, thin film deposition, detoxification of gaseous pollution, plasma display panel, UV excimer lamps and UV excimer laser. 高气压辉光放电有许多应用领域,譬如:表面处理、薄膜沉积、污染气体的消毒、平板等离子体显示、紫外准分子灯和气体激光器等,近年来它的应用得到高速发展。
- In this paper, prevailing TBC deposition technologies, including plasma spray, electron beam-physical vapor deposition, ion beam assisted film deposition and chemical vapor deposition, are reviewed. 综述了热障涂层研究及应用中的几种主要制备技术，包括等离子喷涂、电子束物理气相沉积、离子束辅助沉积、化学气相沉积等。
- In this paper,prevailing TBC deposition technologies,including plasma spray,electron beam-physical vapor deposition,ion beam assisted film deposition and chemical vapor deposition,are reviewed. 综述了热障涂层研究及应用中的几种主要制备技术,包括等离子喷涂、电子束物理气相沉积、离子束辅助沉积、化学气相沉积等。
- Process review shows that the substrate material is the key factor for the carbon films deposition, and the parameters of ion energy, pressure and methane ratio are impotent also. 工艺研究结果表明,衬底材料对制备该新型纳米碳膜具有关键作用,离子能量、工作压力及气氛等工艺因素也具有重要作用。
- The RHEED pattern of the ultra thin LNO film deposited in the relatively high oxygen pressure is streaky pattern. 当氧分压在临界值以上时,LNO薄膜在整个沉积过程中(膜厚小于30nm)的RHEED图样是条纹状,表明层状方式外延生长的特征。
