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- InGaN Films Grown by Metalorganic Chemical Vapor Deposition[J]. 引用该论文 江风益;李述体;王立;彭学新;熊传兵.
- A chemical vapor deposition process that takes place at moderate temperatures. 一种化学汽相淀积过程,发生在适度的温度下。
- Ultrathin organosilicon films were synthesized by chemical vapor deposition. 用化学气相沉积方法制备了超薄有机硅膜。
- Heavy Carbon Doping of GaAs by Metalorganic Chemical Vapor Deposition[J]. 引用该论文 李宝霞;汪韬;李晓婷;赛小锋;高鸿楷.
- The wearresistance of TA1 was improved by chemical vapor deposition(CVD) to enhance the TA1 properties. 为提高TA1表面的耐磨性能,在TA1表面采用化学气相沉积(CVD)表面处理。
- Polycrystalline diamond coatings for tools are laid down using chemical vapor deposition. 工具用的复晶钻石涂层，则是使用化学气相沉积法制造的。
- Carbon nanotubes(CNTs)were prepared from acetylene at 923 K with Ni as catalysts by chemical vapor deposition(CVD). 以乙炔为原料气,采用Ni粉为催化剂,在923K下,由化学气相沉积法(CVD)制得了碳纳米管。
- SWCNTs are produced by three main techniques: arc discharge, laser ablation and chemical vapor deposition (CVD). SWCNTs的制备方法很多，包括电弧放电法、激光蒸发法、化学气相沉积法(Chemical Vapor Deposition，CVD)等。
- The effective channel for improved die life is chemical vapor deposition (CVD) coatings of Ti (C, N) and TiN. 化学气相沉积(CVD)涂层TiN、Ti(C,N)是提高模具使用寿命的有效途径。
- Stacked Ge quantum dots are grown on Si(100) by u ltra-high vacuum chemical vapor deposition(UHV/CVD). 用超高真空化学气相淀积系统在Si(1 0 0 )衬底上生长了多层Ge量子点 .
- The chemical vapor deposition of dia mond films on copper substrates with Ti -Al -Mo intermediate layer was studied. 实验证明,钛-铝-钼过渡层的存在显著提高了金刚石薄膜与铜基底的结合力。
- Stretchable Si films were prepared on single crystal Si wafer with plasma enhance chemical vapor deposition(PECVD). 利用等离子辅助化学气相沉积方法在单晶硅基底表面制备出可延展的硅薄膜。
- The BCN thin films have been mainly synthesized by chemical vapor deposition (CVD). 近几年来，硼碳氮薄膜的制备和性能研究已逐步成为国际上薄膜研究的热点。
- Infrared polycrystal optical materials ZnS were manufactured using chemical vapor deposition(CVD) method in this paper. 采用化学气相沉积方法成功地生长出硫化锌多晶红外光学材料。
- Epitaxial 4H-SiC grown on AlN/Si(100) complex substrate by chemical vapor deposition(CVD) at the relatively low temperature was investigated. 本工作用化学气相淀积方法在A lN/S i(100)复合衬底上生长S iC薄膜。
- Chemical vapor deposition of hard diamond-like carbon (DLC) films was achieved using an inductively coupled plasma source (ICPS). 本文采用感应耦合等离子体源(ICPS)成功地实现化学气相沉积硬质类金刚石(DLC)膜,并考察了基片负偏压对类金刚石膜沉积过程和薄膜性质的影响。
- This paper presents an overview of two new oxdizing techniques for laser-enhanced oxidation ard laser-induced chemical vapor deposition. 本文概述了激光增强氧化和激光诱导化学汽相淀积这两种新的氧化技术。
- Abstract Cr11Ni2W2MoV steel is coated with chemical vapor deposition (CVD). A well bonded and condensed surface layer is TiN. 采用化学气相沉积（CVD）法在1Cr11Ni2W2MoV钢表面获得与基体结合良好的致密的TiN涂层。
- Small size, large density and vertical ordering Ge quantum dots (QDs) were grown by ultra-high vacuum chemical vapor deposition(UHV/CVD) system. 采用超高真空化学气相淀积系统制备了小尺寸、高密度、纵向自对准的Ge量子点 .
- The device structure is optimized firstly, then the structure is grown by metal organic chemical vapor deposition (MOCVD). 首先优化设计了器件结构,并利用金属有机物化学气相淀积(MOCVD)进行了器件的外延生长。
