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- chemical vapor deposition film 化学汽相淀积膜
- The article has introduced the application and development tendency of techniques of film making with chemical vapor deposition in all fields. 本文介绍了化学气相沉积制膜技术在国民经济各个领域中的应用及其发展趋势。
- InGaN Films Grown by Metalorganic Chemical Vapor Deposition[J]. 引用该论文 江风益;李述体;王立;彭学新;熊传兵.
- In this work,(100)-textured CVD diamond film with better quality was obtained by using a hot filament chemical vapor deposition(HFCVD) technique to fabricate as X-ray detectors. 采用HFCVD方法制备了高质量、(100)取向的CVD金刚石膜,在此基础上研制出X射线探测器。
- The traditional ways to obtain polycrystalline film include solid phase crystallization (SPC), low pressure chemical vapor deposition (LPCVD) and excimer laser annealing (ELA). 目前常用的几种获得多晶薄膜的方法包括：低压化学气相沉积、固相结晶、准分子激光晶化等。
- A chemical vapor deposition process that takes place at moderate temperatures. 一种化学汽相淀积过程,发生在适度的温度下。
- Ultrathin organosilicon films were synthesized by chemical vapor deposition. 用化学气相沉积方法制备了超薄有机硅膜。
- Heavy Carbon Doping of GaAs by Metalorganic Chemical Vapor Deposition[J]. 引用该论文 李宝霞;汪韬;李晓婷;赛小锋;高鸿楷.
- To enhance mechanical strength of the copper layer, fluidized-bed chemical vapor deposition (FB-CVD) technique has been carried out to coat a further carbon film on Si-Cu composites. 为了增加铜层的机械强度，流体化化学气相沈积将原来的复合材料再镀上一碳层。
- The relation between characteristics of hot cathode glow discharge and diamond film deposition techniques in hot cathode glow discharge plasma chemical vapor deposition process was discussed. 研究了在热阴极辉光放电等离子体化学气相沉积金刚石膜过程中,热阴极辉光放电特性与金刚石膜沉积工艺的关系。
- S.J.Limb, D.J.Edell, E.F.Gleason, and K.K.Gleason, “Pulsed plasma-enhanced chemical vapor deposition from hexafluoropropylene oxide: film composition study”, J.Appl.Phys.Sci., 67, 1489 (1998). 杨智超;“高密度氯气电浆应用于氮化镓材料蚀刻制程之模型研究”;中原大学化学工程学系硕士论文(2002).
- In this paper, prevailing TBC deposition technologies, including plasma spray, electron beam-physical vapor deposition, ion beam assisted film deposition and chemical vapor deposition, are reviewed. 综述了热障涂层研究及应用中的几种主要制备技术，包括等离子喷涂、电子束物理气相沉积、离子束辅助沉积、化学气相沉积等。
- In this paper,prevailing TBC deposition technologies,including plasma spray,electron beam-physical vapor deposition,ion beam assisted film deposition and chemical vapor deposition,are reviewed. 综述了热障涂层研究及应用中的几种主要制备技术,包括等离子喷涂、电子束物理气相沉积、离子束辅助沉积、化学气相沉积等。
- The wearresistance of TA1 was improved by chemical vapor deposition(CVD) to enhance the TA1 properties. 为提高TA1表面的耐磨性能,在TA1表面采用化学气相沉积(CVD)表面处理。
- Polycrystalline diamond coatings for tools are laid down using chemical vapor deposition. 工具用的复晶钻石涂层，则是使用化学气相沉积法制造的。
- Carbon nanotubes(CNTs)were prepared from acetylene at 923 K with Ni as catalysts by chemical vapor deposition(CVD). 以乙炔为原料气,采用Ni粉为催化剂,在923K下,由化学气相沉积法(CVD)制得了碳纳米管。
- SWCNTs are produced by three main techniques: arc discharge, laser ablation and chemical vapor deposition (CVD). SWCNTs的制备方法很多，包括电弧放电法、激光蒸发法、化学气相沉积法(Chemical Vapor Deposition，CVD)等。
- The effective channel for improved die life is chemical vapor deposition (CVD) coatings of Ti (C, N) and TiN. 化学气相沉积(CVD)涂层TiN、Ti(C,N)是提高模具使用寿命的有效途径。
- Stacked Ge quantum dots are grown on Si(100) by u ltra-high vacuum chemical vapor deposition(UHV/CVD). 用超高真空化学气相淀积系统在Si(1 0 0 )衬底上生长了多层Ge量子点 .
- The chemical vapor deposition of dia mond films on copper substrates with Ti -Al -Mo intermediate layer was studied. 实验证明,钛-铝-钼过渡层的存在显著提高了金刚石薄膜与铜基底的结合力。
