The most prevalent procedure is to use photolithography or electron-beam lithography to produce a pattern in a layer of photoresist on the surface of a silicon wafer.

 
  • 最常用的步骤是用光蚀刻或电子束蚀刻法,在矽晶圆表面的光阻层上制作出图案。
今日热词
目录 附录 查词历史