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- ABSTRACT: In this paper a reactive ion plating method and system configuration of Gas Ion source enhanced Magnetron Sputtering (GIMS) is presented in details. 摘要：本文详细介绍了气体离子源增强磁控溅射（气离溅射）反应离子镀膜技术和系统配置。
- Keywords AlN;Film;Reactive ion plating;Technology optimization; 关键词氮化铝;薄膜;离子反应镀;工艺优化;
- Initial Mechanism Discuss on Synthesis of AlN Thin Film by Activated Reactive Ion Plating with Cathode Arc Source Assisted by Electrons Bath 电子浴辅助阴极电弧源法合成AlN薄膜机理初探
- Reactive ion plating 离子反应镀
- NiCrAlY coating was deposited on Ti6Al4V substrate by arc ion plating (AIP). 采用电弧离子镀(AIP)技术在Ti6Al4V基体表面沉积制备了NiCrAlY涂层。
- NiCrAlY coatings were deposited on superalloy IC-6 by arc ion plating (AIP). 采用电弧离子镀技术在IC-6高温合金上沉积NiCrAlY涂层.
- The reactor is capable of working in the RIE (reactive ion etching) mode and also in the plasma etching mode. 反应腔拥有在RIE(反应离子刻蚀)模式和等离子刻蚀模式下工作的能力。
- Yak hairs were treated by the microwave electron cyclotron resonance plasma reactive ion etching (ECR-RIE) equipment to improve its property of weave. 摘要采用微波电子回旋共振等离子体反应离子刻蚀(ECR-RIE)装置对牦牛毛纤维进行表面改性，从而改善牦牛毛的可纺性。
- Reactive low voltage ion plating 低压反应离子镀
- The experiment of fully automatic reactive ion etching on 3 inch GaAs wafer is described. 介绍了全自动反应离子腐蚀3英寸GaAs片的实验研究工作。
- The arrays were subsequently treated with reactive ion etching (RIE) to slightly reduced the size of the sphere. 制程的开发首先利用黄光微影制作有高低差的沟槽图样，再将单层奈米球排入沟槽之中。
- Cathodic arc ion plating (CAIP) has been widely applied in modern technology field. 多弧离子镀在现代科技领域中有着广泛的应用。
- KEYWORDS : GIMS, ion source, anode layer, sputtering, TiN, ion plating, medium frequency, pulsed DC. 中文关键词：气离溅射、离子源、阳极层流、溅射、氮化钛、离子镀膜、中频、脉冲直流。
- Reactive ion etching (RIE) process utilized to form giant magnetoresistive (GMR) spin valve sensing elements was investigated experimentally. 对巨磁电阻自旋阀磁场传感器制作中的关键技术之一:自旋阀薄膜的反应离子刻蚀(RIE)工艺,进行了试验研究。
- Abstract Plasmas in Multi-Arc Ion Plating(MAIP) are made up of glow and arc plasma. 多弧离子镀中的等离子体是由辉光等离体和弧光等离子体迭加而成的。
- In this paper the etching (RIE) of poly-Si of the electron cyclotron resonance (ECR) reactive ion using CF 4 and Ar was reported. 报道了用CF4和氩气Ar作为工作气体的ECR反应离子刻蚀多晶硅 (poly Si)技术。
- Multi-arc ion plating technique is using cool cathode with self-maintaining arc discharge as evaporation source. 多弧离子镀技术是一种在真空中将冷阴极自持弧光放电用于蒸发源的镀膜技术。
- The influence of chamber pressure,gas flow rate and RF power on micro loading effect in reactive ion etch of silicon dioxide is researched. 结果表明,通过对反应室压力、刻蚀气体流量和射频功率的调节,可以降低微负载效应的影响,得到良好的刻蚀均匀性。
- KEYWORDS: GIMS, ion source, anode layer, sputtering, TiN, ion plating ， medium frequency, pulsed DC. 中文关键词：气离溅射、离子源、阳极层流、溅射、氮化钛、离子镀膜、中频、脉冲直流。
- Yak hairs were treated by the microwave electron cy cl otron resonance plasma reactive ion etching(ECR-RIE) equipment to improve its property of weave. 采用微波电子回旋共振等离子体反应离子刻蚀(ECR-RIE)装置对牦牛毛纤维进行表面改性,从而改善牦牛毛的可纺性。
