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- Si rich SiO2 films have been prepared by a rf magnetron sputter method. 用射频磁控溅射法制备了富硅二氧化硅薄膜。
- Study of Silicon Oxynitride Film Deposited by RF Magnetron Sputtering[J]. 引用该论文 朱勇;顾培夫;沈伟东;邹桐.
- Aluminum film was grown on modified fluorinated polymer composite films by rf magnetron sputtering. 摘要采用射频磁控溅射技术在改性氟塑料表面沉积铝层，制备了金属/氟化高聚物复合薄膜。
- The roughness and granularity of Al film prepared by DC and RF magnetron sputtering arc analyzed using AFM. 用原子力显微镜(AFM)对直流溅射和射频溅射制备铝膜的表面粗糙度及颗粒大小进行了分析比较。
- Au-MgF2 or Ag-MgF2 is a new type of composite material,PLD and RF magnetron sputtering are very good methods in preparing MgF2 film. Au-MgF2与Ag-MgF2薄膜是一种新型复合材料,PLD和磁控溅射是很好的镀薄膜方法。
- In this study , Poly-crystal ZnO films have been grown by RF magnetron sputtering technique and were investigated the CO gas sensing properties . 中文摘要本论文主要以射频磁控溅镀法，探讨氧化锌薄膜对于有毒气体一氧化碳(CO)的感测特性。
- By RF magnetron sputtering technique,we fabricated La2/3Ca1/3MnO3 films and Ag doping La0.67Ca0.33MnO3?Ag polycrystalline films on Si single crystal(001) substrates. 用射频磁控溅射法在不同温度的Si(001)基片上制备了La0.;67Ca0
- The research is concentrated in the orientation control and characterization of ruthenium dioxide (RuO2) thin films deposited by RF magnetron sputtering. 摘要:本研究主要是著重在利用反应式射频磁控溅镀法镀制二氧化钌薄膜之指向控制与分析。
- The fabrication technology of single-element-semiconductor quantum dots is introduced in this paper, including RF magnetron sputtering, Si ion implantation, chemical vapor deposition, sol-gel method. 介绍了单元素半导体量子点的制备方法，包括射频磁控溅射技术、硅离子注入技术、化学气相沉积法、溶胶-凝胶法等；
- The rectifying properties of La_(0.8)Sr_(0.2)MnO_3(LSMO)/Si with SrMnO_3(SMO) as barrier layer were compared with the one without SMO,prepared by using RF magnetron sputtering on Silicon substrate. 对用磁控溅射方法在硅基上直接沉积La0.;8Sr0
- Pb(Zr0.52Ti0.48)O3 (PZT) and (Ba0.7Sr0.3)TiO3 (BST) ferroelectric thin films with distinct perovskite microstructure were prepared by RF magnetron sputtering method ,following a rapid thermal annealing (RTA) process. 应用射频磁控溅射方法;利用快速热退火(RTA)工艺;分别制备出了具有良好铁电性能的 Pb(Zr0.;52Ti0
- In this study, the rf magnetron sputtering was used to deposit BZT ferroelectric thin films on Pt/Ti/SiO2/Si and ITO/glass substrates, and MFM and MFIS structures were also fabricated. 根据系统面板化的观念，对于非晶矽薄膜电晶体与多晶矽薄膜电晶体主动阵列显示器之应用，其电晶体的切换特性也被广泛地讨论与研究。
- RF magnetron sputtering technique 射频磁控溅射
- RF MAGNETRON SPUTTERING DEPOSITION OF SiO_2 THIN FILMS 射频磁控溅射制备SiO_2膜
- Preparation nanometer Si clusters by RF magnetron sputtering technique RF磁控溅射技术制备纳米硅
- Preparation of boron carbon nitride thin films by RF magnetron sputtering 射频磁控溅射制备硼碳氮薄膜
- Crystal Growth of ZnS Thin Film on Si Substrate by RF Magnetron Sputtering 硅基硫化锌薄膜的溅射法生长技术
- Preparation nanometer Si clusters by RF magnetron sputtering tech nique RF磁控溅射技术制备纳米硅
- Keywords PLZT thin films Rf magnetron sputtering Perovskite phase Annealing; PLZT薄膜;磁控射频溅射;钙钛矿相;退火;
- The ZrN films were deposited by RF magnetron reactive sputtering system. 使用反应性磁控溅镀系统成长氮化锆薄膜。
