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- Abstract: An alternative current medium frequency pulsed magnetron sputtering cathode power supply was introduced. 摘 要: 本文介绍了一种中频交流脉冲式磁控溅射靶极电源。
- mid-frequency pulsed magnetron sputtering 中频脉冲磁控溅射
- Developing of alternative current pulsed magnetron sputtering cathode's power supply 交流脉冲式磁控溅射靶极电源的研制
- direct current pulse magnetron sputtering 直流脉冲磁控溅射
- direct current pulse magnetron sputtering(DC-PMS) 直流脉冲磁控溅射（DC-PMS）
- Pulsed magnetron sputtering 非平衡磁控溅射
- The work contains the following aspects: 1.Describe the process of the fabrication of titanium dioxide thin film using a magnetron sputtering and pulsed laser deposition. 内容和结论主要包括:1.;采用磁控溅射和脉冲激光沉积方法制备二氧化钛薄膜的过程。
- Si rich SiO2 films have been prepared by a rf magnetron sputter method. 用射频磁控溅射法制备了富硅二氧化硅薄膜。
- Study of Silicon Oxynitride Film Deposited by RF Magnetron Sputtering[J]. 引用该论文 朱勇;顾培夫;沈伟东;邹桐.
- Boron carbon nitride(BCN) thin films were deposited by radio frequency(RF) magnetron sputtering. 采用射频磁控溅射技术制备出硼碳氮(BCN)薄膜。
- Helium-charged Al films are prepared by direct current (DC) magnetron sputtering with a He/Ar mixture. 摘要采用氦氩混合气氛下直流磁控溅射沉积方法制备含有氦原子的金属铝膜。
- High quality nickel films have been successfully plated on cenosphere particles by dc magnetron sputtering at mom temperature. 摘要本文论述了在空心微珠表面磁控溅射镀金属薄膜的方法。
- TiB_2 and Ti-B-N coatings were prepared by magnetron sputtering on 1Cr18Ni9Ti stainless steel. 用磁控溅射法在1Cr18Ni9Ti不锈钢上沉积了TiB2和Ti-B-N涂层。
- A new type closed field-unbalanced magnetron sputtering technology for optical coatings is described. 介绍了一种制备高质量光学薄膜的新型闭磁场磁控溅射技术。
- Thin film manganin gages and ytterbium gages were fabricated by magnetron sputtering. 采用磁控溅射法制备锰铜薄膜,溅射和真空蒸发法制备镱薄膜。
- This system can be used either as multi-arc or magnetron sputtering PVD individually. 也可以单独作为磁控溅射或多弧离子镀膜机使用。
- AlN films with special function and excellent structure can be grown under proper conditions by magnetron sputtering. 采用磁控溅射技术,可以选用在适当的条件下制备具有特定功能与结构优良的氮化铝薄膜。
- Aluminum film was grown on modified fluorinated polymer composite films by rf magnetron sputtering. 摘要采用射频磁控溅射技术在改性氟塑料表面沉积铝层，制备了金属/氟化高聚物复合薄膜。
- The power supply will be convenient for controlling the magnetron sputtering coater automatically. 该电源为磁控溅射镀膜设备实现自动控制提供了方便。
- Study on the preparation and properties of antireflective ITO thin films by magnetron sputtering[J]. 引用该论文 李世涛;乔学亮;陈建国;王洪水;贾芳.
