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- Imaging interferometric lithography with bidirection biased illumination[J]. 引用该论文 冯伯儒;张锦;刘娟.
- For phase masks working in 248 nm wavelength can be generated by using interferometric lithography. 其中我们利用干涉微影术制作应用于波长248奈米的相位光罩。
- Imaging Interferometric Lithography (IIL) has high resolution of interferometric lithography (IL) and ability for printing arbitrary patterns of optical lithography (OL). 摘要成像干涉光刻技术(IIL)具有干涉光刻技术(IL)的高分辨力和光学光刻技术(OL)产生任意形状集成电路特征图形的能力。
- Imaging Interferometric Lithography (IIL) transfers different components of spatial frequencies through the same limited aperture at different time to enhance the resolution power of lithography with increasing less cost of system. 摘要掩模投影成像干涉光刻技术以在很小或几乎不增加光刻系统成本的基础上来提高光刻分辨率为目的，充分利用系统的有限孔径，将掩模图形不同的空间频率分别进行传递，最终以高分辨率对掩模成像。
- Study of interferometric lithography without masks 无掩模激光干涉光刻技术研究术
- Study on Laser Interferometric Lithography 激光干涉光刻技术
- Study on imaging interferometric lithography 掩模投影成像干涉光刻研究
- Imaging interferometric lithography 成像干涉光刻
- Interferometric lithography (IL) 干涉光刻
- Laser interferometric lithography 激光干涉光刻
- Laser Interferometric Lithography with Wavefront Divided by a Trapezoidal Prism 采用梯形棱镜波前分割的激光干涉光刻技术
- Imaging interferometric lithography and its spatial frequency analysis 成像干涉光刻技术及其频域分析
- Imaging interferometric lithography with bidirection biased illumination 采用双向偏置曝光的成像干涉光刻技术
- Comparison Between Imaging Interferometric Lithography and Off-Axis Illumination Lithography 成像干涉光刻技术与离轴照明光刻技术的对比分析
- Interferometric lithography 干涉光刻
- The graphic arts include calligraphy and lithography. 平面造型艺术包括书法和平版印刷术。
- The Fundamental Limits of Optical Lithography. 光刻的限制。
- A print produced by lithography. 平版印刷所制的版
- Lithography - The process used to transfer patterns onto wafers. 光刻-从掩膜到圆片转移的过程。
- Surface Plasmon Interferometric Microscopy for Imaging[J]. 引用该论文 戴启伟;张剑;汪国平.
