For VLSI, a plane surface may be approximated by depositing the interlevel dielectric by bias-sputter deposition (see Section 9. 2. 4) or by using planarization.是什么意思_For VLSI, a plane surface may be approximated by depositing the interlevel dielectric by bias-sputter deposition (see Section 9. 2. 4) or by using planarization.在线翻译_英语_读音_用法_例句