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- InGaN Films Grown by Metalorganic Chemical Vapor Deposition[J]. 引用该论文 江风益;李述体;王立;彭学新;熊传兵.
- Produce a chemical vapor to be inhaled in order to relieve nasal congestion. 制造为了减轻鼻子充血的供吸入的化学水蒸气。
- An airtight fumigation chamber in which chemical vapors are used to destroy insects and fungi on plants. 密封熏蒸室一种用于杀死植物上的害虫和真菌的充溢化学气体的密封烟熏室
- A chemical vapor deposition process that takes place at moderate temperatures. 一种化学汽相淀积过程,发生在适度的温度下。
- Ultrathin organosilicon films were synthesized by chemical vapor deposition. 用化学气相沉积方法制备了超薄有机硅膜。
- Heavy Carbon Doping of GaAs by Metalorganic Chemical Vapor Deposition[J]. 引用该论文 李宝霞;汪韬;李晓婷;赛小锋;高鸿楷.
- However, before he could reach the truck, the chemical vapors ignited, engulfing Charlie. 然而他还没来得及够着卡车，化学蒸汽已燃烧起来，一时间火舌吞灭了查里。
- The wearresistance of TA1 was improved by chemical vapor deposition(CVD) to enhance the TA1 properties. 为提高TA1表面的耐磨性能,在TA1表面采用化学气相沉积(CVD)表面处理。
- Polycrystalline diamond coatings for tools are laid down using chemical vapor deposition. 工具用的复晶钻石涂层，则是使用化学气相沉积法制造的。
- Infrared spectra from the several typical chemical vapors were observed remotely using the RFX 40 passive Fourier transform infrared spectrometer. 40干涉型被动式傅立叶变换红外光谱仪用于远距离遥感化学蒸气微弱红外光谱。
- Carbon nanotubes(CNTs)were prepared from acetylene at 923 K with Ni as catalysts by chemical vapor deposition(CVD). 以乙炔为原料气,采用Ni粉为催化剂,在923K下,由化学气相沉积法(CVD)制得了碳纳米管。
- SWCNTs are produced by three main techniques: arc discharge, laser ablation and chemical vapor deposition (CVD). SWCNTs的制备方法很多，包括电弧放电法、激光蒸发法、化学气相沉积法(Chemical Vapor Deposition，CVD)等。
- The effective channel for improved die life is chemical vapor deposition (CVD) coatings of Ti (C, N) and TiN. 化学气相沉积(CVD)涂层TiN、Ti(C,N)是提高模具使用寿命的有效途径。
- BC 2N thin films were deposited by hot filament assisted chemical vapor deposition (CVD) on Si and diamond substrates. 应用热丝辅助射频等离子体化学气相沉积法在硅、金刚石衬底上合成了 BC2 N薄膜 .
- Stacked Ge quantum dots are grown on Si(100) by u ltra-high vacuum chemical vapor deposition(UHV/CVD). 用超高真空化学气相淀积系统在Si(1 0 0 )衬底上生长了多层Ge量子点 .
- Erosive wear behavior of chemical vapor deposited multilayer tungsten carbide coating. 化学气体的侵蚀损耗作用形成多层碳化钨外壳。
- The chemical vapor deposition of dia mond films on copper substrates with Ti -Al -Mo intermediate layer was studied. 实验证明,钛-铝-钼过渡层的存在显著提高了金刚石薄膜与铜基底的结合力。
- Stretchable Si films were prepared on single crystal Si wafer with plasma enhance chemical vapor deposition(PECVD). 利用等离子辅助化学气相沉积方法在单晶硅基底表面制备出可延展的硅薄膜。
- The BCN thin films have been mainly synthesized by chemical vapor deposition (CVD). 近几年来，硼碳氮薄膜的制备和性能研究已逐步成为国际上薄膜研究的热点。
- UHMWPE fiber were treated by chromic acid etching and chemical vapor depositing polypyrrole(PPy). 摘要采用铬酸刻蚀和化学气相沉积聚吡咯处理了超高相对分子质量聚乙烯(UHMWPE)纤维。
