Boron nitride (BN) thin films were deposited on Si substrates using the conventional radio-frequency (RF) sputtering system, with hexagonal boron nitride (hBN) target and working gas of argon (or mixture of nitrogen and argon).

• 使用射频溅射(RF)系统,靶材为烧结的六角氮化硼(hBN),工作气体为氩气(或氩气和氮气的混合气),在硅衬底上沉积氮化硼薄膜。