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- vacuum deposition method 真空沉积法
- Lida Vacuum Deposition Technology Co., Ltd. 利达真空镀膜技术有限公司。
- The dry plating method is a method for deposition of a metal on the surface of polymer material under vacuum and includes sputtering method, vapor deposition, vacuum deposition, etc. 干镀是一种在真空下在聚合物表面沉积金属的方法，包括溅射、气相沉积、真空沉积等。
- The principle of ion assisted deposition technology in the vacuum deposition process is discussed. 讨论了离子束辅助沉积技术在真空沉积过程中的应用原理。
- In vacuum deposition,the substrate deformation caused by sustentation and temperature grads can affect the final surface form of film-substrate system. 真空镀膜过程中,基底因支撑、温度梯度造成的应变会对最终的薄膜-基底系统的面形产生影响。
- The diffusion coefficient of RaA atoms,being 0.071cm~2/s,was determinedusing two-filter wall deposition method. 采用壁沉积方法;测得 RaA 的扩散系数 D=0.;071cm~2/s。
- The reflectors of the space reflective concentrator solar-cell-array were coated with aluminum films by vacuum deposition. 摘要铝膜反射镜是反射式空间聚光太阳电池阵的重要组成部分。
- TiO2 films were prepared by sol-gel and print screen method, MgO/TiO2 films were prepared by liquid deposition method. 用sol-gel法和丝网印刷法制备多孔TiO2薄膜,溶液沉积法制备MgO/TiO2复合薄膜。
- The pearly pigment of mica titanium was prepared by using the liquid deposition method with the urea as precipitant. 采用尿素作为中和剂,用液相沉积法制备了云母钛珠光颜料。
- Semiconductor industry： Sputtering system, Vacuum deposition system, Ion plating system, Electron beam process, Vacuum packaging machine, Device handling system. 半导体行业：薄膜制备设备、器件封装设备、各种排气装置等；
- A template-free electrochemical deposition method for preparations of ZnO nanorod array is reported. 摘要报道了一种氧化锌纳米线阵列的无模板电沉积制备方法。
- Abstract： C-N films were synthesized on high-resistance Si(111) substrates by cluster beam deposition method. 利用荷能团簇沉积装置在高阻硅(111)衬底上沉积了碳氮薄膜。
- BaTiO_3/SrTiO_3 (BTO/STO) multilayer films have been fabricated on Pt/Ti/SiO_2/Si substrates by a pulsed laser deposition method. 采用脉冲激光沉积法在Pt/Ti/SiO2/Si衬底上制备了BaTiO3/SrTiO3(BTO/STO)多层膜。
- The plating used an economical copper replacement deposition method that differs from general electrodeless-plating pretreatment. 利用简单、低成本的置换沉积铜法新工艺，进行表面金属化处理。
- It should be noted that the high molecular weights of ITF05 and ITF06 prevent from using the method of vacuum deposition for device manufacturing.Superhigh vacuume systems might reduce this problem. 然而ITF05和ITF06无法利用蒸镀法制作薄膜，必须找寻更高真空度的仪器设备，再作元件效率的探讨。
- Ionized cluster beams(ICB) is a deposition method which can form high quality film even single crystal in room temperature. 离化团束沉积是一种可在室温条件下获得高质量薄膜甚至单晶膜的沉积方法。
- Silica glass was synthesized by plasma chemical vapor deposition method, which uses inductively coupled plasma as the heat source. 用高频等离子体作为热源,采用化学气相沉积法合成了石英玻璃样品。
- Carbon nanofiber(CNF),a kind of new carbon material,synthesized by catalytic vapor deposition method was used as catalyst for oxidative dehydrogenation of propane(ODP). 研究了纳米碳纤维(CNF)新型碳材料催化丙烷氧化脱氢反应的催化性能。
- In this paper,we used the hot filament chemical vapor deposition method to synthesize fine grain diamond films on silicon wafers aiming to exploit diamond's acoustic properties. 金刚石/硅声表面波基片的金刚石层晶粒的细化有利于传播能量损耗的降低,采用热丝化学气相沉积法进行了硅基体上沉积细晶粒金刚石工艺的初步探索。
- In this paper, we used the hydrolyze deposition method at low temperatures to prepare titania,used AgNO3 deposit and SiO2 pack relating to modification of TiO2. 本文采用低温水解沉淀法制备二氧化钛，并使用硝酸银（AgNO3）沉积与二氧化硅（SiO2）包裹两种方法来对二氧化钛制备中进行改性。
