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- ultrapure photoresist 超高纯度光刻胶
- Study on Process of Water-soluble Printing Photoresist. 水性印花感光制版材料的研究。
- The first ultrapure fiber was made just four years later, in 1970. 仅仅四年之后，全球首个超纯纤维就于1970年问世。
- Thereafter, the patterned photoresist layer is removed. 此后，移除图案化光刻胶层。
- This paper introduces a chemically amplified photoresist appropriate for argon ion laser direct imaging. 本文介绍一种氩离子激光直接成像化学增幅感光树脂。
- The RASIRC products deliver ultrapure steam that increases growth rate and decreases operating costs. 该产品提供RASIRC超纯蒸汽，增加生长率和降低运营成本。
- The RASIRC Steamer produces ultrapure steam by boiling de-ionized water, which is inexpensive and widely available. RASIRC汽轮机的生产超纯蒸汽煮沸去离子水，这是价格低廉，广为散发。
- In this study, ozonized water in the single wafer processor was used to study photoresist stripping. 本文主要研究臭氧水在单片晶圆旋式蚀刻机中，来去除晶圆表面的光阻的能力。
- It consists of 25 ultrapure crystals of sodium iodide totalling around 250 kilograms in mass. 它由25个总重约250千克超纯的碘化钠晶体组成。
- The paper introduces the principle, component and common breakdown of MILLIPORE ultrapure water system. 本文介绍了密理博超纯化水系统的简单原理、组成及常见故障。
- The groove width is reduced by employing a slope-etching process to form the photoresist pattern. 通过采用倾斜蚀刻工艺形成光致抗蚀剂图案，从而减小了凹槽的宽度。
- Main factors of influencing photoresist thickness for dip coating is analysed in this paper. 分析了提拉法涂胶中影响胶膜厚度的主要因素，并据此确定出胶膜厚度；
- Use of ultrapure dialysate in reduction of chronic inflammation during Hemodialysis . 文章的名字Arizono K;Nomura K;Motoyama T;et al.
- The method on profile-control of micro-optic element in photoresist was presented. 介绍了连续微光学元件在光刻胶上的面形控制方法。
- The specification, preparation, packing, storage and production of ultrapure sulphuric acid (UPS) are introduced. 介绍了超纯硫酸的规格、制备方法、包装、贮运及其生产情况。
- Rectangular photoresist gratings can be fabricated by taking advantage of the nonlinearity of photoresist. 利用光刻胶的非线性效应可以制作出了矩形的全息光栅。
- A small undesired hole in an oxide, opaque region of a mask or reticle, or in a photoresist layer. 氧化物、掩模或标线的不透明区域,或光刻层中不需要的小孔。
- A method of removing a photoresist or a photoresist residue from a semiconductor substrate is disclosed. 公开了从半导体基底上去除光致抗蚀剂或者光致抗蚀残留物的一种方法。
- Based on the metal wiremesh filter, the feasibility of this kind of filtration technology used to get ultrapure cryogenic liquid was validated. 摘要以金属丝网过滤器为研究对象，在介绍金属丝网的结构特点和过滤机理的基础上，论证了采用该种新技术获得超高纯低温液体的可行性。
- This paper researches the influence of resin and wetting agent for the property of photoresist. 本论文研究了光阻剂中分别增加环氧树脂和润湿剂对其性能的影响。
