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- The thin film deposition can control precisely the height of the step and can obtain smooth surface. 薄膜沉积法具有精确控制台阶高度及台阶表面较光滑的优点。
- Ensinger W.Ion Source for ion beam assisted thin film deposition[J].Rev.Sci.-Instrum.1992,63(11):5217. 潘永强;朱昌;陈智利;等.;端部霍尔离子源工作特性及等离子体特性研究[J]
- Recently, various magnetron sputtering lines for thin film deposition on large-size glass substrate grow rapidly and attract significant attention. 摘要近年来，各种工业生产规模的玻璃基片大平面磁控溅射生产线发展迅速，令人关注。
- DOE's fabrication techniques mainly include laser beam or electron beam writing, RIE, ion milling and thin film deposition. 衍射光学元件的制作技术主要包括激光或电子束直写、反应离子刻蚀、离子束铣及薄膜沉积。
- Progress in organic-inorganic layered perovskite materials about their structures, thin film deposition techniques and properties were summarized. 摘要概述了层状类钙钛矿有机-无机分子组装材料的结构、成膜方法以及性能的研究进展，并分析了影响其结构和性能的部分因素。
- Magnetron sputtering is a widely used method for thin film deposition in recent years,which makes a great impact on the industrial production and scientific research. 近年来磁控溅射技术的应用日趋广泛,在工业生产和科学研究领域发挥巨大作用。
- High-pressure glow discharge has many applications such as surface modification, thin film deposition, detoxification of gaseous pollution, plasma display panel, UV excimer lamps and UV excimer laser. 高气压辉光放电有许多应用领域,譬如:表面处理、薄膜沉积、污染气体的消毒、平板等离子体显示、紫外准分子灯和气体激光器等,近年来它的应用得到高速发展。
- thin film deposition technol ogy 镀膜技术
- The XPS analysis indicates that the stoichiometric excess of CSN in both solutions shows that the CuSCN thin film deposited on ITO glass is ptype semiconductor. 通过XPS分析表明:2种溶剂中制备的CuSCN薄膜均为SCN化学剂量比过量,具有p型半导体特征。
- Filtered Cathodic Arc Plasma Source and Thin Film Deposition 磁过滤的阴极弧等离子体源及其薄膜制备
- PARALLEL COMPUTATION FOR THE THIN FILM DEPOSITION ON THE NOW 基于机群系统的薄膜淀积并行计算
- ITO Thin Film Deposition by ECR Plasma Enhaced Reactive Evaporation 微波ECR等离子体辅助反应蒸发沉积ITO膜
- Keywords C 3N 4;MPCVD;thin film deposition;ultrahard materials; 微波等离子体化学气相沉积法;薄膜沉积;超硬材料;
- Residual Stress and Thermal Stability of AlN Thin Films Deposited by Reactive Laser Ablation[J]. 引用该论文 汪洪海;熊贵光;田德成;汪洪海;郑启光;丘军林.
- The porous TiO 2 anatase thin films deposited on glass were prepared from titanium alkoxide solution containing polyethylene glycol (PEG) by dip coating technique. 从含聚乙二醇的钛醇盐溶胶前驱体出发 ;通过浸渍提拉法在玻璃表面制备了锐钛矿型多孔TiO2 薄膜 .
- It is found that V_2O_5 thin films deposited by EDP are a compact microstructure with finer adhesive force with ITO substrate and the thickness is uniform. 实验结果表明,电泳沉积V2O5薄膜具有致密的显微结构,薄膜厚度均匀、与基片的粘附性很好;
- The research is concentrated in the orientation control and characterization of ruthenium dioxide (RuO2) thin films deposited by RF magnetron sputtering. 摘要:本研究主要是著重在利用反应式射频磁控溅镀法镀制二氧化钌薄膜之指向控制与分析。
- Based on the theory of extremum method, a simple optic system was used to make on-line monitor of the growing status of thin films deposited at the end faces of optical fibers. 二、在极值法监控理论的基础上，利用简单的光纤光路系统，对光纤端面上组装的薄膜生长情况实现在线监测。
- P. Nunes, D. Costa, E. Fortunato and R. Martins, “Performances presented by zinc oxide thin films deposited by r.f. magnetron sputtering,” Vacuum, vol. 64, pp. 293-297, 2002. 水瑞鐏，”氧化锌薄膜特性及其在通讯元件与液体感测器上之应用”，国立成功大学电机工程学系博士论文，(2002)。
- The preparation and characterization of copper indium disulphide (CuInS2) thin films deposited on Mo-coated soda-lime glass by chemical bath deposition (CBD) technique have been performed. 用化学水浴法(Chemical Bath Deposition,CBD)在ITO玻璃衬底上制备了太阳能电池用的CuInS_2薄膜。
