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- It consists of a copper cylinder as the cathode base filled with titanium deuteride powder in the cavity of the cathode base as a sputter target material. 它由1 个圆柱形的铜阴极心和填满其中心孔的氘化钛溅射靶构成。
- The demand for sputtering target materials are increased with the rapid development of the electronic and information industries in the world. 随着电子及信息产业突飞猛进的发展,世界溅射靶材的需求量越来越大。
- Technological Study of Powder Metallurgical High-pure Chrome for Sputtering Target Material 粉末冶金高纯铬和铬合金溅射靶材烧结工艺研究
- Manufacture and application of sputtering target materials 溅射靶材的应用及制备初探
- Sputtering target materials for optical data storage 光信息存储的溅镀靶材
- Trend in development and applications of sputtering target materials 溅射靶材的应用及发展趋势
- sputtering target materials 溅射靶材
- A new net-shape cathode sputtering target which has a simple structure and a high sputtering rate was put forward. 设计了一种网状阴极溅射靶,它是由多个空心阴极并列交叉组合而成。
- A new net\|shape cathode sputtering target which has a simple structure and a high sputtering was put forward. 研究设计了一种网状阴极溅射靶,它是由多个空心阴极并列交叉组合而成。
- Sputter targets and evaporation materials available upon request. 注:可按客户要求加工各种形状和尺寸的金属靶材及蒸发材料。
- Many kinds of sputtering ceramic target materials are necessary for manufacturing in IT and their market scale of are increasing rapidly. 在信息产业不少基础产品的制造过程中需使用多种陶瓷溅射靶材,世界陶瓷靶材的市场销售规模日益扩大。
- The paper describes the technology for the preparation of ITO sputter target by CIP and sintering process. 采用冷等静压-烧结法制备了ITO磁控溅射靶材。
- Using sintered B4C as target material, ternary BCN thin films were synthesized by means of pulsed laser deposition assisted by nitrogen ion beam. 以烧结B4C为靶材料、在氮离子束辅助下用脉冲激光沉积方法制备了三元化合物硼碳氮(BCN)薄膜。
- AAM also offers 99.95 pure Nb sputtering Target for thin film applications.We supply ingot,plate and final target depending on customer needs. 中精伦也为高科技行业提供高纯铌靶,我们根据客户的具体需要提供铸锭、板材和最终靶材。
- The thermal shock wave is an important mechanic phenomenon of the material re-sponse preduced in the target material bombarded by electron beain. 热击波是电子束辐照靶材料时在其内产生材料响应的一个重要力学现象。
- Abstract: Fast photography is used to investigate the back-ejecta of tantalum target material after interaction with high intensity current pulse electron beam. 摘 要: 叙述了用高速摄影技术研究强流脉冲电子束与钽金属靶相互作用后靶材的回喷现象,得出了靶材回喷的速度。
- The tritium was produced after irradiation by proton beams for all target materials, especially there is 131I in lead target material. 所选靶材料在照射后会产生长寿命放射性核素氚,其中,铅靶材料中还会产生131I。
- The material is flawed throughout. 这种材料到处是裂缝。
- Bonding of Target Material and Backing Plate for 9900 Sputtering System 9900型靶材与靶托的连接技术
- He insists the condition to use the best material. 他坚持以使用最好的材料为条件。