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- screenless photolithography 无网照相平印
- A picture made by photolithography. 照相平版印刷品由照相平版术制成的照片
- Why not use photolithography to make nanostructures? 为什麽不使用光蚀刻法制造奈米结构?
- The develop of Fourier storage photolithography system[J]. 引用该论文 浦东林;陈林森;解剑锋;沈雁.
- Analysis of nanometrology and atom photolithography[J]. 引用该论文 张文涛;李同保.
- Photolithography: forming electrodes in the form required on the ITO film. 光刻:在ITO表面形成要求形状的电极。
- Effect of distortion of mask on photolithography pattern quality[J]. 引用该论文 杜惊雷;曾阳素;黄晓阳;粟敬钦;郭永康;崔铮.
- First, consider the advantages and disadvantages of photolithography. 首先,想想光蚀刻法的优点跟缺点。
- The prepared hybrid materials could be patterned by photolithography and might be used in optical channel waveguides. 因此此类材料可有制备通道波导之潜力。
- The parylene anchor with very deep semi sphere recess is fabricated utilizing the dry film photolithography technique. 聚对二甲基苯固定器拥有一个非常深的半圆形沟槽,这是运用乾式薄膜光阻的技术制作而成。
- Implementation Methods for Amplitude Division Maskless Laser Interference Photolithography[J]. 引用该论文 张锦;冯伯儒;郭永康.
- In Fig. 3B, avidin protein was printed by photolithography onto a biotinylated PSI surface. 三号乙,抗生物素蛋白印刷光刻到生物防扩散表面。
- Methods: Master stamps for soft lithography were produced using photolithography. 方法: 主模版采用光刻方法制备,使用硅作为基片。
- Various technical improvements have made it possible to push the limits of photolithography. 各种技术若能改进,便可推进光蚀刻法的极限。
- Alignment Precision - Displacement of patterns that occurs during the photolithography process. 套准精度-在光刻工艺中转移图形的精度。
- With 300 lines of Photolithography and screen resolution, with cyberctm indosinian. 如果拔取300线网屏的特技拍照制版,不离可得回有动感的印不败品了。
- New Filtering Approach on Partial Coherent Imaging System for Improving Photolithography Resolution[J]. 引用该论文 杜惊雷;张怡霄;杨静;刘世杰;肖啸;郭永康;杜春雷.
- Fabrication process of the sensor is introduced, especially the double alignment in the photolithography. 分析了比较信号平均效应对两种膜型的影响。
- Removal of Pixel Structures by Optimizing the Parameters of Imaging System in Digital Photolithography[J]. 引用该论文 郭小伟;杜惊雷;陈铭勇;杜春雷.
- The most prevalent procedure is to use photolithography or electron-beam lithography to produce a pattern in a layer of photoresist on the surface of a silicon wafer. 最常用的步骤是用光蚀刻或电子束蚀刻法,在矽晶圆表面的光阻层上制作出图案。