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- In this study , Poly-crystal ZnO films have been grown by RF magnetron sputtering technique and were investigated the CO gas sensing properties . 中文摘要本论文主要以射频磁控溅镀法，探讨氧化锌薄膜对于有毒气体一氧化碳(CO)的感测特性。
- By RF magnetron sputtering technique,we fabricated La2/3Ca1/3MnO3 films and Ag doping La0.67Ca0.33MnO3?Ag polycrystalline films on Si single crystal(001) substrates. 用射频磁控溅射法在不同温度的Si(001)基片上制备了La0.;67Ca0
- Influence of RF Sputtering Condition on ZnO Transparent Conducting Film. RF反应溅射条件对ZnO透明导电薄膜的影响。
- In this study, the RF sputtering system has been investigated comprehensively. 中文摘要本篇论文主要是探讨RF溅镀系统之研究。
- Ba0.65Sr0.35TiO3(BST)thin films were deposited on Pt/Ti/SiO2/Si substrates by inverted cylindrical RF sputtering. 采用倒筒式射频溅射方法;在Pt/Ti/SiO2/Si基片上制备了Ba0.;65Sr0
- RF magnetron sputtering technique 射频磁控溅射
- The coefficient of friction of the sample prepared by RF sputter had inversely-proportional relationship with S/W ratio in definitive range. 通过射频溅射所获得薄膜的摩擦系数在一定范围内与其硫钨比成反比。
- Magnetically controlled cathod plasma sputtering technique was used to manufacture the plating manganin film. 用磁控溅射低温沉积镀膜技术制做锰铜薄膜 ,能够保持薄膜中锰、铜、镍成份的相对稳定和锰铜合金正六面三元固溶体金相结构的特性。
- The coating glass with excellent properties can be prepared by heat evaporate technique or magnetron sputtering technique. 采用热蒸发镀膜与磁控溅射一样也能生产出性能优良的幕墙玻璃。
- ITO thin films were prepared by radio-frequency magnetron sputtering technique at different sputtering power,and applied to HIT solar cells. 采用射频磁控溅射技术在不同射频功率下沉积了ITO薄膜,并将其应用于HIT太阳电池。
- In RF sputtering processes, it was observed that total metallic silver percentage in thin films was independent of RF power when oxygen partial pressure exceeded some specific value. 但是在射频溅镀制程中，氧气分压比例超过一特定值时，薄膜中银的百分比不会随镀膜功率提高而增加。
- AES and ESCA has been applied to the analysis of the superconducting Nb-Ge film which were deposited onto sapphire substrate by a low-energy sputtering technique. 利用表面分析仪器俄歇电子能谱(AES)仪和电子能谱化学分析(ESCA)仪对超导Nb-Ge溅射膜进行表面和深度剖面分析,以探讨在溅射沉积成膜过程中A15结构Nb_3Ge能够稳定生长的机制,以及影响其转变温度T_c的因素。
- GaAs films have been deposited on substrates of quartz glass and silicon slices by radio frequency magnetron sputtering technique in the atmosphere with or without hydrogen. 作者单位：五邑大学薄膜与纳米材料研究所;华南理工大学物理科学与技术学院;
- The coating is deposited on thin quartz crystal sheet with double ion beam sputter technique, the measuring results show that the spectral character and image quality are perfect. 采用双离子束溅射技术在石英晶体薄片上淀积了该膜系，经测试，光谱特性满足设计要求，成像效果理想。
- The ion gold mixing plating is multi arc ion plating combining with magnetron sputtering technique and is mainly used in gold plating to replace the commonly used but harmful nickel plating. 离子掺金镀是多弧离子镀与磁控溅射有机复合技术，主要用于离子镀金代替目前盛行而危害人体健康的闪镍工艺。
- Preparation nanometer Si clusters by RF magnetron sputtering technique RF磁控溅射技术制备纳米硅
- STUDY ON YELLOWISH OF FLUOROCARBON FILMS PREPARED BY RF SPUTTERING 射频溅射法制备氟碳高分子膜的泛黄问题研究
- Dielectric breakdown of BST thin films prepared by RF sputtering 射频溅射制备的BST薄膜介电击穿研究
- The Effect of Substrate DC Bias on the RF Sputtering Co-Cr Film 基板直流偏压对高频溅射Co-Cr膜的影响
- The Effects of Ar Pressure on Ge/Si Multilayers by Rf Sputtering 射频溅射中氩气压强对Ge/Si多层膜的影响
