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- photoresist coater 涂胶器
- Blade coater: Machine for blade coating. 刮刀涂布机:用刮刀把涂剂涂布的机器。
- Study on Process of Water-soluble Printing Photoresist. 水性印花感光制版材料的研究。
- Thereafter, the patterned photoresist layer is removed. 此后，移除图案化光刻胶层。
- The new press will replace the company’s 4-color press with coater. 新的新闻将取代该公司的四色塑机与镀膜机。
- That press, with a flexo chamber coater, will be on the floor at drupa. 这一新闻，以柔印涂布室，将在地板上在德鲁巴。
- Curtain coat can be pressure head, flow head (WEIR) or roller curtain coater. 淋涂可能配压力嘴，淋涂滚。
- We are a ps coater and supply lots of material to the printing industry. 询盘内容:Looking for PET and BOPP film to supply to the printing industry.
- This paper introduces a chemically amplified photoresist appropriate for argon ion laser direct imaging. 本文介绍一种氩离子激光直接成像化学增幅感光树脂。
- A fluidized-bed coater was used to coat the pellets, and the coating formulations were optimized by orthogonal design. 结果优化条件所得的微丸综合质量评价指标达到优秀，体外释放符合一级释药模型。
- In this study, ozonized water in the single wafer processor was used to study photoresist stripping. 本文主要研究臭氧水在单片晶圆旋式蚀刻机中，来去除晶圆表面的光阻的能力。
- The groove width is reduced by employing a slope-etching process to form the photoresist pattern. 通过采用倾斜蚀刻工艺形成光致抗蚀剂图案，从而减小了凹槽的宽度。
- Main factors of influencing photoresist thickness for dip coating is analysed in this paper. 分析了提拉法涂胶中影响胶膜厚度的主要因素，并据此确定出胶膜厚度；
- The method on profile-control of micro-optic element in photoresist was presented. 介绍了连续微光学元件在光刻胶上的面形控制方法。
- Air in coating color greatly influences the paper quality and coater runnability. 涂料中的气体将影响到涂布纸质量和涂布机的运行性能。
- Rectangular photoresist gratings can be fabricated by taking advantage of the nonlinearity of photoresist. 利用光刻胶的非线性效应可以制作出了矩形的全息光栅。
- The application of mineral fiber as a filler in coater in white board top liner is discussed. 矿物纤维对面浆加填后,能够达到降低成本,提高不透明度,提高遮盖力的目的。
- The article described the construction, characteristic, function and application of the recycled bottle coater. 本文介绍了实用型旧瓶翻新机的结构原理、技术特点、性能指标和使用效果。
- A small undesired hole in an oxide, opaque region of a mask or reticle, or in a photoresist layer. 氧化物、掩模或标线的不透明区域,或光刻层中不需要的小孔。
- A method of removing a photoresist or a photoresist residue from a semiconductor substrate is disclosed. 公开了从半导体基底上去除光致抗蚀剂或者光致抗蚀残留物的一种方法。
