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- The Fundamental Limits of Optical Lithography. 光刻的限制。
- Shanghai Optical Lithography Electronic Engeering Corp. 上海光刻电子科技有限公司。
- The research results show that IIL can get the high resolution more effectively than conventional optical lithography (OL). 研究结果表明，掩模投影成像干涉光刻技术比传统投影光刻能够得到更高的光刻分辨率。
- The optical lithography correction techniques become key technologies in the IC designing and manufacturing of VDSM. 光刻校正技术已成为超深亚微米下集成电路设计和制造中关键的技术。
- Imaging Interferometric Lithography (IIL) has high resolution of interferometric lithography (IL) and ability for printing arbitrary patterns of optical lithography (OL). 摘要成像干涉光刻技术(IIL)具有干涉光刻技术(IL)的高分辨力和光学光刻技术(OL)产生任意形状集成电路特征图形的能力。
- Off-axis illumination for optical lithography 光学光刻中的离轴照明技术
- nextgeneration optical lithography 下一代光刻
- The Present Situation of Optical Lithography and Its Future 光学光刻技术现状及发展趋势
- Yield Driven Optical Lithography Correction Techniques 成品率驱动的光刻校正技术
- Resolution Enhancement Techniques in Optical Lithography 光学平版印刷术的坚定增加技术
- Application of Surfactant in the Optical Lithography Technology for IC Chip 表面活性剂在IC芯片光刻工艺中的应用
- The Status of Optical Lithography and the Market of Lithography Equipment 光学光刻现状及设备市场
- Fundamental Principles of Optical Lithography: The Science of Microfabrication 光刻技术基本原理:微型制造学
- His optic nerve was hurt in an accident. 他的视神经在一次事故中受到损伤。
- Microscopes and telescopes are optical instruments. 望远镜和显微镜是光学仪器。
- Match and Mixed Lithography Technology Between E-Beam Lithography System and Optical Lithography System 光学和电子束曝光系统之间的匹配与混合光刻技术
- The optic theory originated with Einstein. 光学理论是爱因斯坦首创的。
- Keywords magnetic tunnel junction;tunneling magnetoresistance;contact-shadow-mask method;optical lithography methods; 磁性隧道结;隧穿磁电阻;金属掩模法;光刻法;
- A mirage is an optical illusion. 海市蜃楼是一种视错觉。
- 2.The research results show that IIL can get the high resolution more effectively than conventional optical lithography (OL). 研究结果表明，掩模投影成像干涉光刻技术比传统投影光刻能够得到更高的光刻分辨率。
