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- Keywords Monocrystalline Silicon Wafer;Grinding;Surface Layer Damage;Microcrack;Residual Stress; 单晶硅片;磨削;表面层损伤;微裂纹;残余应力;
- Zhang Yinxia. Study on the surface layer damage of monocrystalline silicon wafer induced by ultra-precision grinding [D]. Dalian: Dalian University of Technology, 2006 张银霞.;单晶硅片超精密磨削加工表面层损伤的研究[D]
- monocrystalline silicon wafer 单晶硅片
- Hot plate with silicon wafer lowered to heating position. 加热板与矽晶圆降低至加热位置。
- Mechanical Test Wafer - A silicon wafer used for testing purposes. 机械测试晶圆片-用于测试的晶圆片。
- monocrystalline silicon wafers 单晶硅片
- Contamination Particulate - Particles found on the surface of a silicon wafer. 沾污颗粒-晶圆片表面上的颗粒。
- Hot plate with silicon wafer in initial configuration (before heating). 加热板与矽晶圆在启始状态(加热前)。
- Free abrasive wire saw technique is the main method for monocrystalline silicon slicing process. 游离磨料线锯切割技术是目前单晶硅切片的主要加工方法。
- This paper attempts to review the effect on FZ monocrystalline silicon by annealing. 阐述了热处理对辐照区熔硅单晶的影响。
- SiO2, an insulator, can be formed by oxidation of surface of the silicon wafer. 经净化的晶棒接著用机械方法切成薄片.;这些切片就叫做晶圆
- Company FZ monocrystalline silicon competitiveness of the good will continue to expand its share of the market. 公司区熔硅单晶的良好竞争能力将使得市场份额继续扩大。
- Processing and manufacturing monocrystalline silicon and V-Ti products projects have been put into operation here. 单晶硅，钒钛制品加工制造项目已在区内落地。
- A New Method of Resistless Photochemical Etching for Silicon Wafer[J]. 引用该论文 杨杰;刘焰发;村原正隆.
- Herein, nanometer multilayer copper/cobalt film was prepared on monocrystalline silicon surface by electrodeposition under double pulsed potential. 采用双脉冲控电位技术在单晶硅上沉积铜/钴纳米多层膜。
- This product adopting import monocrystalline silicon solar energy package or and seals up exempting the maintenance lead-acid battery entirely. 该产品采用进口单晶硅太阳能组件或及全密封免维护铅酸蓄电池。
- In our country,only we can provide ultra-high-resistance monocrystalline silicon produced in “vacuum” and used for manufacturing special device. 我们也是国家唯一能提供真空区熔超高阻单晶硅的企业，产品广泛运用于特种器件的生产之中。
- High stability of vacuum pressure in the hearth of Czochralski(CZ) crystal growing furnace plays a very important role in the normal growth of monocrystalline silicon. 直拉单晶炉生长过程中炉膛内真空度的高稳定性对硅单晶正常生长起到很重要的作用。
- Contamination Area - An area that contains particles that can negatively affect the characteristics of a silicon wafer. 沾污区域-部分晶圆片区域被颗粒沾污,造成不利特性影响。
- Based on the theory of hydrodynamic lubrication,hydrodynamic action in the free abrasive monocrystalline silicon slicing process using a wiresaw was studied. 基于流体动压理论,研究了单晶硅自由磨料线锯切片过程中的流体动压效应。
