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- After glow Microwave plasma enhanced CVD system 隔离行微波等离子体增强型CVD系统
- microwave plasma enhanced chemical vapor deposition 微波等离子体辅助化学气相沉积
- Preparation of B-N Films by Remote Microwave Plasma Enhanced CVD from Borazine B_3N_3H_6微波等离子体增强化学气相沉积B-N薄膜
- microwave plasma enhanced 微波等离子体增强
- The influence of bias enhanced nucleation(BEN) to the adhesion between diamond coating and WC-6%Co carbide cutting tool is researched with the microwave plasma (CVD) instrument. 在微波等离子体化学气相沉积装置中 ,研究了负偏压形核对金刚石薄膜与WC 6%25硬质合金刀具附着力的影响。
- The Plasma Batch System 300 is a compact Microwave Plasma Batch System for resist ashing and wafer cleaning in semiconductor applications. 微波等离子体300是一个简洁的微波等离子,主要应用于半导体方面的灰烬消除和晶片清洁。
- CN x films were deposited on the Si(100) substrates with microwave plasma CVD method. 沉积在Si(100)基片上的CNx膜是用微波等离子体化学气相沉积法(MWPCVD)制备的。
- DLC films were deposited by capacitively coupled radio frequency plasma enhanced chemical vapor deposition. 顶层DLC膜用容式耦合射频等离子体增强化学气相沉积方法制备。
- The diamond films doped with boron were synthesized on the Si 3N 4 substrate by microwave plasma CVD method (MPCVD). 采用微波等离子体化学气相沉积 ( MPCVD)的方法在 Si3N4 基片上制作了掺硼金刚石薄膜。
- Determination of alkali earth metal by microwave plasma torch atomic emission spectrometry (MPT AES) was investigated. 用微波等离子体炬原子发射光谱法(MPT-AES)测定了一些碱土金属元素。
- A example of new approaches to functionalization of nonwovens using plasma enhanced modification of nonwovens was presented. 介绍一种运用等离子处理来改善非织造材料表面性能的新方法。
- Formation of polymeric deposit was investigated in methane conversion by microwave plasma. 摘要考察了微波等离子体甲烷转化反应中积炭的形成条件。
- Without doping,plasma enhanced chemical vapor deposition (PECVD) of silica films on Si substrates with gas mixtures of SiH_4 and N_2O is considered. 以硅烷和氧化二氮作为反应气体,采用等离子体增强化学气相沉积(PECVD)技术,不使用掺杂,在单晶硅衬底上制备了用于平面光波导的二氧化硅薄膜。
- Plasma systems 400 and 660 are low-pressure microwave plasma systems for cleaning advanced chip packages prior to die attach, wire bond and encapsulation. 等离子体400和660系列是低压微波等离子体应用于提高模具粘合,引线的焊接,特别是清洗高级的芯片封装。
- Fluorinated diamond-like carbon(F-DLC) films were grown by RF plasma enhanced chemical vapor deposition(PECVD) in a gas mixture of CF4 and CH4 and annealed in Ar environment. 以CF4和CH4为源气体,利用射频等离子体增强化学气相沉积法,在不同条件下制备了氟化类金刚石(F-DLC)薄膜,并进行了退火处理。
- This paper presents a new method of reduction of sintering low concentration fume absorbed with solid waste by microwave plasma. 提出了一种微波-固体废弃物吸附法降低烧结低浓度有害废气的新方法。
- The a-Si films is deposited by plasma enhanced chemical vapor deposition technique with the optimum technology.The AC resistively of sample is measured. 用化学气相沉积法在最佳工艺条件下制备了非晶硅薄膜,测量了样品的交流电阻率。
- Watanabe I,Sugata K.Diamond films synthesized by microwave plasma CVD of ethylalcohol[J].Jpn J Appl Phys,1988,27(8):1397. 丁发柱;石玉龙.;直流等离子体-热丝化学气相沉积金刚石薄膜的研究[J]
- Microwave plasma torch atomic emission spectrometry(MPT-AES) was used to determine the content of calcium and zinc in kelp after being digested. 分别使用常规消解方法与微波消解方法处理海带样品,采用微波等离子体炬原子发射光谱法(MPT-AES)测定海带中钙和锌的含量。
- The method for improving surface wettability of styrene butadiene rubber using microwave plasma is provided in this paper. 介绍了一种用微波等离子体处理消声瓦橡胶以提高表面湿润性的方法,并用蒸馏水和醇对接触角进行测定。