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- Diamond disk conditioners have long served the semiconductor chemical mechanical polishing (CMP) process for polish pad dressing. 摘要钻石修整器应用于化学机械抛光中抛光垫的修整，已有很长的一段时间。
- chemical mechanical polish (CMP) 化学机械平坦化
- electrochemical mechanical polish (EC- MP) 电化学机械抛光
- Chemical Mechanical Polishing (CMP) is the most effective way to achieve global planarization in semiconductor process. 化学机械抛光，是半导体制程中达到全域平坦化最有效的办法，同时也是众多制程中不可或缺的重要制程步骤。
- Chemical mechanical polishing (CMP) is the mostly used planarization process in the semiconductor industry today. 摘要:化学机械抛光是现在半导体产业中最常被使用的平坦化制程。
- Chemical mechanical polishing (CMP) is the most effective method to achieve global planarization in semiconductor industry. 化学机械抛光，是目前半导体制程中达全域平坦化最有效的方式，同时也是许多制程中不可缺少的步骤。
- Give the table a good rub with this polish. 用这上光剂把桌子好好擦一擦。
- Boning, D., W. Moyne and T. Smith, “Run by Run Control of Chemical Mechanical Polishing,” IEEE Trans. CPMT (C), 19, 307-314 (1996). 周育乐，考虑制程使用时间之批次控制方法，台湾大学工业工程研究所硕士论文，台北，台湾(2000)。
- G. Corlett, “Targeting Water Use for Chemical Mechanical Polishing,” Solid State Technology, Vol. 43, No. 6, pp. 201-206 (2000). 蔡明莳，“化学机械研磨后清洗技术简介”，奈米通讯，第6卷，第1期，第21-27页（1999）。
- Both high material removal rate(MRR) and smooth surface have to be achieved in primary chemical mechanical polishing(CMP) of hard disk substrates. 硬盘盘基片粗抛光必须在较高材料去除率的基础上获得高表面质量。
- With compensation-oriented chemical mechanical polishing (CMP) as the carrier, the study elucidates the procedures of this method for the innovative research and development case. 以补偿式化学机械抛光为载具，作为进行创新研发之案例来阐述本方法之流程步骤。
- Chemical mechanical polishing (CMP) technology has been considered as the most effective local and global planarization technology for wafer and widely used in ULSI fabrication. 化学机械抛光(CMP)是目前唯一能够实现硅片局部和全局平坦化的实用技术和核心技术，正广泛地应用于IC制造中。
- Four years of college gave her considerable polish. 四年的大学教育使她更加完美。
- Shoot! I forget to take off my nail polish. 糟糕！我忘了擦掉指甲油。
- Slurry flow weighs heavily on the performances of chemical mechanical polishing(CMP) process,wherein the pad surface will alter the flow features considerably. 抛光垫表面特性能可大大改变抛光液的流动情况,从而影响化学机械抛光的抛光性能。
- A hot plate will spoil the polish on this table. 热盘子会毁坏桌面的光泽。
- Would you polish up the article a bit? 你把文章再润色一下好吗?
- This feature can be eliminated via mechanical polishing and followed by chemical etching, and hence only exciton line was observed for the damage-removed sample. 此篇论文中所有的化合物半导体单晶样品，在做光学量测之前，皆有经过机械磨光以及化学蚀刻的处理。
- You should use wax polish on wooden furniture. 你应在木制家俱上打上蜡。
- Is this equipment tested for mechanical aptitude? 这台设备测定了其机械适应性了吗？
